OLED Microcavity Patterning via Reflective Anode Protection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The interface between separately prepared transparent conductive film layers in OLED microcavity structures affects the efficiency and spectrum of outgoing light, and the repeated etching of the reflective anode during patterning processes impacts reflectivity.
Innovation Solution
A manufacturing method for OLED microcavity structures involves forming reflective anodes and transparent conductive film layers with specific thicknesses and patterning them using pixel masks, with the reflective anode serving as a protective layer to eliminate interface influences and prevent damage during etching, using magnetron sputtering for deposition and acid solutions for etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If transparent conductive film layers are prepared separately for different pixels, then the manufacturing process can accommodate different thickness requirements for different pixels, but the interface between separately prepared layers affects the efficiency and spectrum of outgoing light
Solution Approach 1:
The patent merges the preparation of transparent conductive film layers for different pixels into a single continuous deposition process. Instead of preparing separate layers for each pixel that would create interfaces, the method deposits multiple layers of different thicknesses in one continuous process, eliminating the harmful interfaces while maintaining the ability to have different thicknesses for different pixels.
2Ease of manufacture
If the reflective anode is etched multiple times during the patterning process of transparent conductive film layers, then the transparent conductive film layers can be patterned for different pixels, but the reflectivity of the reflective anode is affected
Solution Approach 1:
The patent inverts the traditional patterning sequence by first patterning the transparent conductive film layer and then using it as a mask to pattern the reflective anode in a single step. This reversal means the reflective anode is etched only once rather than multiple times, preserving its reflectivity while still achieving the required pixel patterns.
3Reliability
If a thick transparent conductive film layer is prepared to eliminate interface influences, then the light output efficiency is improved, but the patterning process becomes more complex requiring multiple etching steps
Solution Approach 1:
The patent performs preliminary patterning of the transparent conductive film layer before depositing and patterning the reflective anode. By preparing the pattern mask in advance on the transparent conductive film layer, the subsequent patterning of the reflective anode can be done in a single etching step using this pre-prepared mask, reducing overall process complexity despite working with thick film layers.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances light output by minimizing the impact of interfaces between transparent conductive film layers and prevents reflectivity issues caused by repeated etching, resulting in improved color gamut display capabilities.
Implementation Method 1
using magnetron sputtering for deposition
Implementation Method 2
etching away part of the transparent conductive film layer and part of the reflective anode, which are not covered by the pixel mask, with an acid solution
Implementation Method 3
the first transparent conductive film layer is subjected to an annealing process after the first structure surface is formed
Data Source
AI summary
A manufacturing method of OLED microcavity structure is provided. The manufacturing method includes: forming a reflective anode on a substrate; forming a transparent conductive film layer having a thickness corresponding to a required pixel on the reflective anode; patterning the transparent conductive film layer and the reflective anode with a pixel mask corresponding to the required pixel to form a pattern of the required pixel; and repeating the above steps on a resultant structure surface according to display requirements until a pixel display structure required by a display device is obtained.