OLED Panel Insulating Layer Thickness Variation for Flatness
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Solution Overview
Problem
Top-emission OLED display technology faces challenges in achieving substrate flatness, especially for large or super-large sizes, where the thickness of film layers required for metal wires leads to increased level differences, making it difficult for ordinary flat films to meet the flatness requirements, which can result in optical issues like color cast and brightness unevenness.
Innovation Solution
The OLED panel is designed with a structure that includes a first region and a second region, where the thickness of the insulating layer in the first region is less than in the second region, improving the global flatness of the film layer and planarization layer, thereby enhancing the quality and brightness uniformity of the organic light-emitting structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If thicker film layers are used for metal wires in large-sized OLED panels, then electrical conductivity is improved, but substrate flatness deteriorates
Solution Approach 1:
The patent applies local quality by making the insulating layer thickness non-uniform across different regions. Specifically, the insulating layer has a first thickness in a first region and a second thickness in a second region, where the thickness varies locally to compensate for the level differences caused by thick metal wire layers. This allows the substrate to maintain both good electrical conductivity (with thick metal wires) and acceptable flatness (through localized thickness compensation).
Solution Approach 2:
The patent changes the physical parameter of the insulating layer thickness to resolve the contradiction. By adjusting the thickness parameter of the insulating layer in different regions (first thickness vs. second thickness), the overall substrate flatness is improved while maintaining the necessary electrical conductivity provided by the thick metal wire layers. This parameter change allows simultaneous satisfaction of both electrical and optical requirements.
2Manufacturing precision
If thicker insulating layers are used to maintain flatness, then substrate flatness is improved, but manufacturing complexity increases
Solution Approach 1:
Rather than using a uniformly thick insulating layer throughout, the patent implements local quality by varying the insulating layer thickness in specific regions. This approach improves substrate flatness without requiring a completely complex multi-layer structure, as the variation is applied locally where needed rather than throughout the entire device.
Solution Approach 2:
The insulating layer is segmented into different thickness regions (first region with first thickness, second region with second thickness). This segmentation allows the structure to achieve improved flatness through controlled thickness variation while maintaining a relatively simple overall film layer architecture, avoiding the need for numerous additional layers.
Data Source
AI summary
The present disclosure provides a display device and an OLED panel thereof, and a method for manufacturing an OLED panel. The OLED panel includes: a substrate (10), and a light-emitting structure (11) disposed on the substrate (10), wherein at least one film layer (12) and a planarization layer disposed on the at least one film layer (12) are disposed between the substrate (10) and the light-emitting structure (11); the OLED panel comprises a first region (12a) and a second region (12b), wherein a source (124a) and a drain (124b) of the transistor are disposed in the first region (12a); wherein the at least one film layer (12) comprises an insulating layer, wherein a thickness of the insulating layer in the first region (12a) is less than a thickness of the insulating layer in the second region (12b). According to the embodiments of the present disclosure, the global flatness of the at least one film layer is improved, thereby improving the planarization effect of the planarization layer, and further improving the quality of the organic light-emitting layer and the brightness uniformity of the sub-pixels.