Patterned Organic Light Emitting Layers for Etching Damage Reduction
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Solution Overview
Problem
The challenge in manufacturing high-resolution display devices, such as head-mounted displays, is the damage to organic light-emitting layers due to etching gases, particularly when using FMM technology for forming red, green, and blue pixels, which limits the application of these devices to smaller panels and complicates the production of large-area panels.
Innovation Solution
A display device design featuring a substrate with subpixel areas, electrodes, and organic light-emitting layers with patterned layers, where the second pattern layer is formed separately to cover the first pattern layer, reducing exposure to etching gases and minimizing damage, and the third pattern layer connects the layers, enhancing protection and reducing defect rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If FMM technology is used to form red, green and blue pixels, then manufacturing of small-to-medium panels is enabled, but large area panels cannot be manufactured due to mask shadow sagging
Solution Approach 1:
The patent replaces the mechanical FMM mask shadow formation method with a chemical deposition process. The organic light emitting layer is formed by depositing organic materials that are then patterned through chemical etching processes, eliminating the need for large-area physical masks and their associated sagging problems.
Solution Approach 2:
The invention extracts and removes the problematic mask shadow formation step from the manufacturing process. By using direct deposition and chemical patterning methods, the patent eliminates the intermediate mechanical masking step that causes sagging in large-area panels.
2Manufacturing precision
If photographic process is used to form organic light emitting layer, then pattern formation is achieved, but organic light emitting layer is damaged due to etching gas
Solution Approach 1:
The patent applies a protective layer to the organic light emitting layer before the etching process. This protective layer is deposited in advance to shield the organic material from direct exposure to harsh etching gases, preventing damage while allowing precise pattern formation.
Solution Approach 2:
The invention introduces a protective intermediary layer between the etching gas and the organic light emitting layer. This intermediate layer acts as a barrier that allows the etching process to proceed with high precision while protecting the sensitive organic material from gas-phase damage.
3Measurement precision
If ultra-high resolution is required for head mounted display, then display quality is improved, but organic light emitting layer damage increases due to etching gas
Solution Approach 1:
The protective layer is deposited before the high-precision etching process required for ultra-high resolution displays. This preliminary protection allows the aggressive etching conditions needed for fine pattern formation without damaging the organic light emitting layer.
Solution Approach 2:
The patent uses a protective intermediary layer that enables the precise patterning required for ultra-high resolution while mediating the harmful effects of etching gases on the organic material.
4Object-affected harmful factors
If exposure time to etching gas is reduced, then organic light emitting layer damage is reduced, but pattern formation quality may be affected
Solution Approach 1:
The protective layer is applied in advance to enable shorter exposure times. With this preliminary protection in place, the etching process can be performed quickly and aggressively without damaging the organic layer, maintaining both high speed and high precision.
Solution Approach 2:
The protective intermediary layer allows the etching process to proceed with reduced exposure time by shielding the organic material, thus preventing damage while maintaining pattern formation quality through controlled chemical etching.
Data Source
AI summary
A display device comprises a substrate provided with a first subpixel area and a second subpixel area, a first electrode provided on the substrate, including a first sub electrode provided in the first subpixel area and a second sub electrode provided in the second subpixel area, an organic light emitting layer including a first organic light emitting layer arranged on the first sub electrode and a second organic light emitting layer arranged on the second sub electrode, and a second electrode arranged on the organic light emitting layer, wherein the first organic light emitting layer includes a first pattern layer, a second pattern layer provided on the first pattern layer and a third pattern layer provided on the second pattern layer, the second organic light emitting layer includes a first pattern layer, a second pattern layer provided on the first pattern layer and a third pattern layer provided on the second pattern layer, the first pattern layer of the first organic light emitting layer is spaced apart from the first pattern layer of the second organic light emitting layer, the second pattern layer of the first organic light emitting layer is spaced apart from the second pattern layer of the second organic light emitting layer, and the third pattern layer of the first organic light emitting layer is connected with the third pattern layer of the second organic light emitting layer, and the second pattern layer of the first organic light emitting layer is provided to cover an upper surface and a side of the first pattern layer of the first organic light emitting layer. Therefore, a damage of the light emitting layer can be reduced.