Organic Light Emitting Device Pixel Defining Layer Formation
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Solution Overview
Problem
The formation of a pixel defining layer in organic light emitting devices often damages the organic light emitting layer due to patterning processes, and using inorganic materials for this layer leads to surface damage during dry etching, affecting the device's characteristics.
Innovation Solution
A method involving the formation of a blocking layer on the first electrode, followed by a pixel defining layer that exposes the electrode's side, allowing for the creation of an intermediate layer with an organic light emitting layer, which is then covered by a second electrode, without requiring separate masking processes and minimizing surface damage during etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If photolithography and wet etching are used to form the pixel defining layer, then the pixel defining layer can be formed, but the organic light emitting layer may be damaged
Solution Approach 1:
The patent divides the pixel defining layer into multiple layers: a lower pixel defining layer formed by photolithography and wet etching, and an upper pixel defining layer formed by spin coating. This segmentation allows the lower layer to provide structural definition while the upper layer protects the organic light emitting layer from damage during etching processes
Solution Approach 2:
The lower pixel defining layer is formed in advance before the organic light emitting layer is deposited. This preliminary action creates a protective barrier that prevents direct contact between the organic layer and subsequent etching processes, thereby protecting the organic material from damage
2Ease of manufacture
If dry etching is used to form the pixel defining layer from inorganic material, then the pixel defining layer can be formed, but the surfaces of electrodes may be damaged due to plasma discharge
Solution Approach 1:
The patent introduces a blocking layer as an intermediary between the electrode and the pixel defining layer. This blocking layer serves as a sacrificial mask that protects the electrode surface from plasma discharge damage during dry etching of the pixel defining layer, while allowing the etching process to proceed effectively
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the easy formation of a pixel defining layer without damaging the organic light emitting device, improving its electrical characteristics and reducing surface damage during the etching process, particularly when using inorganic materials for the pixel defining layer.
Implementation Method 1
patterning is performed by using photolithography and wet etching
Implementation Method 2
patterning is performed by using photolithography and wet etching so as to form openings for defining pixels
Implementation Method 3
due to a plasma discharge which occurs during dry etching, the surfaces of electrodes may be damaged
Data Source
AI summary
A method of manufacturing an organic light emitting device by which a pixel defining layer can be easily formed. The method includes: forming a first electrode on a substrate; forming a photoresist layer to cover the first electrode; patterning the photoresist layer and forming a blocking layer so that the blocking layer is on a side of the first electrode opposite to a side facing the substrate; forming a pixel defining layer on the substrate to cover side ends of the first electrode; removing the blocking layer and exposing the side of the first electrode contacting the blocking layer; forming an intermediate layer including an organic light emitting layer on the side of the first electrode that is exposed by removing the blocking layer; and forming a second electrode on the intermediate layer.