OLED Display Polysilicon Layer Patterning for Mask Reduction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The manufacturing of large organic light emitting diode (OLED) displays is hindered by the increasing number of masks required in photolithography processes, leading to deteriorated productivity.
Innovation Solution
A simplified OLED display structure and manufacturing method that reduces the number of photolithography processes by forming multiple layers and patterns simultaneously, including a polycrystalline silicon layer pattern, gate insulating layer pattern, and conductive layer patterns, using a combination of photolithography and double exposure processes to minimize the number of steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the number of masks is increased to manufacture large OLED displays, then the display size can be increased, but the productivity deteriorates
Solution Approach 1:
The patent merges the formation of gate insulating layer pattern, polycrystalline silicon layer pattern, and first conductive layer pattern into a single photolithography process step. This consolidation reduces the number of separate mask steps from eight or more to fewer steps, thereby improving manufacturing productivity while maintaining the capability to produce large display sizes.
2Manufacturing precision
If multiple photolithography processes are used to form different layers and patterns, then the manufacturing precision can be maintained, but the device complexity increases
Solution Approach 1:
Multiple layer patterns (gate insulating layer pattern, polycrystalline silicon layer pattern, and first conductive layer pattern) are formed simultaneously in one photolithography step, reducing the number of separate processes while maintaining manufacturing precision through a unified patterning approach.
Solution Approach 2:
A single photolithography process performs multiple functions by forming different layer patterns simultaneously, making the process multi-functional and reducing overall process complexity while maintaining the precision needed for each individual layer pattern.
Data Source
AI summary
An organic light emitting diode (OLED) display and a manufacturing method thereof, the OLED display includes: a substrate main body; a polycrystalline silicon layer pattern including a polycrystalline active layer formed on the substrate main body and a first capacitor electrode; a gate insulating layer pattern formed on the polycrystalline silicon layer pattern; a first conductive layer pattern including a gate electrode and a second capacitor electrode that are formed on the gate insulating layer pattern; an interlayer insulating layer pattern formed on the first conductive layer pattern; and a second conductive layer pattern including a source electrode, a drain electrode and a pixel electrode that are formed on the interlayer insulating layer pattern. The gate insulating layer pattern is patterned at a same time with any one of the polycrystalline silicon layer pattern and the first conductive layer pattern.