OLED Display Conductive Pattern Layout for Stitch Boundary Artifacts
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Solution Overview
Problem
Stitching exposure in light emitting devices using organic light emitting elements leads to image quality degradation due to variations in parasitic capacitance and light emission intensity at the boundaries of exposed regions.
Innovation Solution
The conductive patterns formed using stitching exposure are arranged with a deviation from the center of the display region, ensuring the boundary does not pass through the center and is positioned in less visually noticeable areas, thereby minimizing the impact on image quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If stitching exposure is performed to manufacture large-size light emitting devices, then the device size is increased, but image quality degradation occurs at the boundary between exposed regions
Solution Approach 1:
The patent applies local quality by making the conductive pattern configuration position-dependent. Specifically, in the first region, the conductive pattern is configured with a first configuration, while in the second region (adjacent to the first region), the conductive pattern is configured with a second configuration that differs from the first. This local variation in pattern configuration addresses the stitching exposure boundary issue by creating different electrical characteristics in different regions, thereby suppressing image quality degradation at the boundary while maintaining large device size.
2Ease of manufacture
If the conductive pattern configuration is made uniform across regions, then manufacturing is simplified, but image quality degradation occurs at stitching boundaries
Solution Approach 1:
The patent implements local quality by configuring the conductive pattern with a first configuration in the first region and a second configuration in the second region. This approach accepts increased manufacturing complexity as a necessary trade-off to prevent image quality degradation at stitching boundaries. The different configurations in different regions create electrical characteristics that compensate for stitching exposure effects, thereby maintaining high image quality across the entire large-size device.
Data Source
AI summary
Alight emitting device including, on a main surface of a semiconductor substrate, a display region in which pixels are arranged, is provided. The main surface includes a first region in which a first conductive pattern is arranged, and a second region which is adjacent to the first region and in which a second conductive pattern is arranged. Each of the pixels includes an organic light emitting element and a driving transistor. Each of the first conductive pattern and the second conductive pattern includes a conductive pattern connected to a gate electrode of the driving transistor in one of the pixels. The first region and the second region are adjacent at a boundary with a deviation between the first conductive pattern and the second conductive pattern, and the boundary does not pass through a center of the display region.