OLED Display Substrate Ion Implantation for Sub-Pixel Crosstalk Isolation
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Solution Overview
Problem
Existing display technologies face challenges with electrical crosstalk between adjacent sub-pixels in organic light-emitting diode (OLED) displays, which affect display performance and resolution.
Innovation Solution
A display substrate with an ion implantation portion between adjacent sub-pixels, comprising P-type and N-type doped layers, electrically isolating the sub-pixels and reducing crosstalk, and a manufacturing method that includes ion implantation to form these layers without additional structures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If additional isolation structures are added between adjacent sub-pixels, then electrical crosstalk is reduced, but device complexity and manufacturing steps increase
Solution Approach 1:
The patent combines the isolation function with the existing pixel defining layer by doping it with ions, merging the isolation structure with the pixel defining structure. This eliminates the need for separate isolation structures while maintaining electrical isolation between adjacent sub-pixels, thus reducing device complexity while improving reliability
Solution Approach 2:
The patent changes the electrical parameters of the pixel defining layer by introducing ion doping (P-type or N-type), transforming it from a non-conductive or weakly conductive layer to a highly conductive isolation layer. This parameter change enables the layer to perform both pixel definition and electrical isolation functions simultaneously
2Reliability
If additional isolation structures are added between adjacent sub-pixels, then electrical crosstalk is reduced, but manufacturing precision requirements increase
Solution Approach 1:
By merging the isolation function into the pixel defining layer, the patent eliminates the need for separate isolation structures and their associated alignment requirements. The ion doping process is performed on the existing pixel defining layer pattern, reducing manufacturing precision requirements while achieving reliable electrical isolation
3Reliability
If ion implantation is used to dope the organic material layer, then electrical isolation is achieved, but the organic material layer may be damaged
Solution Approach 1:
The patent carefully controls ion implantation parameters (ion type, energy, dose) to achieve sufficient electrical isolation while minimizing damage to the organic material layer. By optimizing these parameters, the isolation effect is achieved without compromising the integrity of the organic layers
Solution Approach 2:
The patent uses the pixel defining layer as an intermediary structure that receives the ion doping. This intermediary approach allows the isolation function to be achieved without directly exposing the sensitive organic material layer to high-energy ion bombardment, thus protecting the organic layers from damage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces electrical crosstalk between sub-pixels, improving display resolution and performance by maintaining the integrity of the light-emitting layers while simplifying the manufacturing process.
Implementation Method 1
the organic material film layer includes an ion implantation portion and an organic material layer, the ion implantation portion is between adjacent two sub-pixels among the plurality of sub-pixels, and the ion implantation portion is to electrically isolate film layers of the adjacent two sub-pixels
Data Source
AI summary
A display substrate, a manufacture method, and a display device are provided. Display substrate includes a substrate, and a light-emitting device layer on substrate. Light-emitting device layer includes an organic material film layer including an organic material layer and an ion implantation portion; and a material of ion implantation portion includes organic material layer material and doped ions. Light-emitting device layer includes sub-pixels, each sub-pixel includes a first electrode, an organic material layer on the first electrode away from the substrate, and a second electrode on the organic material layer away from the substrate; and organic material layer includes a light-emitting material layer. First electrodes of adjacent two sub-pixels are at an interval. Ion implantation portion is between adjacent two sub-pixels, and ion implantation portion is to electrically isolate film layers of adjacent two sub-pixels that are between first electrodes and a surface of light-emitting material layer away from substrate.