Transparent Conductive Layer Segmentation for OLED Color Purity
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Solution Overview
Problem
Existing OLED display technologies face challenges in achieving high color gamut and maintaining surface flatness of transparent conductive layers with different thicknesses, leading to damage during etching processes.
Innovation Solution
A manufacturing method for a display substrate involving the formation of light emitting units with different color light emitting units, where transparent conductive layers are formed with identical etching rates and a transparent etching barrier layer is used to prevent damage, allowing for varying thicknesses and maintaining surface flatness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If transparent conductive layers with different thicknesses are formed to adjust optical lengths for wide color gamut, then color purity is improved, but surface flatness deteriorates and damage occurs during etching processes
Solution Approach 1:
The transparent conductive layer is segmented into multiple sub-layers (first transparent conductive layer and second transparent conductive layer) with different thicknesses. This segmentation allows each layer to be optimized independently - the first layer provides base conductivity while the second layer adjusts optical length, thereby achieving wide color gamut while maintaining surface flatness through controlled thickness variation.
Solution Approach 2:
Different regions of the transparent conductive structure are given different local qualities through varying thicknesses of the second transparent conductive layer. This local quality variation enables precise control of optical path length in different areas, improving color purity for specific wavelength ranges while maintaining overall surface flatness through the supporting first layer.
2Manufacturing precision
If transparent conductive layers with different thicknesses are formed to achieve wide color gamut, then color accuracy is improved, but damage occurs during etching processes
Solution Approach 1:
The first transparent conductive layer serves as a cushioning layer formed beforehand to provide mechanical support and protection. This layer is designed with sufficient thickness and structural integrity to prevent damage to the overall transparent conductive structure during subsequent etching processes, while the second layer can be optimized for color accuracy without compromising strength.
Solution Approach 2:
The transparent conductive structure uses composite material design with at least two different transparent conductive layers. These layers can have different material compositions optimized for their specific functions - the first layer for structural integrity and etching resistance, and the second layer for optical length adjustment and color accuracy, thereby achieving both wide color gamut and etching durability.
Data Source
AI summary
A display substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of the display substrate includes: forming light emitting units of at least two colors on a base substrate, which includes: forming a first electrode, a light emitting layer and a second electrode on the base substrate. An electrode sub-layer and a transparent structure are formed on the base substrate to form the first electrode. A first transparent conductive layer, a transparent etching barrier layer and a second transparent conductive layer are formed on a side of the electrode sub-layer away from the base substrate to form the transparent structure of the first color light emitting unit. An etching rate of the first transparent conductive layer and an etching rate of the second transparent conductive layer are substantially identical, and thicknesses of transparent structures in different light emitting units are different.