OLED Vacuum Chamber Cleaning with Remote Plasma Pre-Clean
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Solution Overview
Problem
Existing vacuum systems in OLED device manufacturing fail to maintain adequate cleanliness levels, which adversely affect the quality of deposited organic material layers.
Innovation Solution
A method involving pre-cleaning followed by plasma cleaning using a remote plasma source is employed to enhance the cleanliness of vacuum systems, achieving a cleanliness level of less than 10−9 grams/cm², thereby improving the quality of organic material layers deposited on substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional cleaning methods are used in the vacuum system, then the cleaning process is simple and quick, but the cleanliness level is insufficient (greater than 10^-9 grams/cm²)
Solution Approach 1:
The patent applies preliminary action by performing a first cleaning procedure (such as thermal field cleaning or chemical cleaning) before the plasma cleaning procedure. This pre-cleaning removes bulk contaminants and prepares the surface, making the subsequent plasma cleaning more effective at achieving the required cleanliness level of less than 10^-9 grams/cm² without excessive complexity
Solution Approach 2:
The patent uses plasma as an intermediary cleaning mechanism that bridges the gap between conventional cleaning methods and the required ultra-high cleanliness levels. The plasma cleaning procedure acts as a mediator that can achieve molecular-level cleaning without requiring direct mechanical or chemical contact that would complicate the system
2Manufacturing precision
If multiple cleaning procedures are performed to achieve high cleanliness levels, then the cleanliness level improves (less than 10^-9 grams/cm²), but the cleaning time increases
Solution Approach 1:
The patent implements continuous useful action by performing cleaning procedures sequentially without breaking vacuum or interrupting the overall process. The first cleaning procedure transitions directly into the plasma cleaning procedure, maintaining continuous action that achieves high cleanliness levels without unnecessary time losses from system venting or reconfiguration
Solution Approach 2:
The patent applies parameter changes by adjusting plasma cleaning parameters (such as power, gas flow rate, and treatment duration) to optimize the balance between cleaning effectiveness and time consumption. By carefully controlling these parameters, the system achieves cleanliness levels below 10^-9 grams/cm² while minimizing the time required for the cleaning process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method significantly enhances vacuum system cleanliness, ensuring high-quality deposition of organic material layers on substrates by minimizing contaminant levels, thus improving the overall manufacturing process.
Implementation Method 1
performing plasma cleaning using a remote plasma source
Data Source
AI summary
The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.