OLED Common Voltage Line Pattern for Layer Alignment Precision

The patent introduces alignment patterns (such as the first alignment pattern and second alignment pattern) that are formed in advance during the manufacturing process. These patterns serve as reference markers that enable precise alignment of subsequent layers through overlay processes, thereby maintaining manufacturing precision even as the number of manufacturing steps increases.

The patent employs alignment patterns as intermediary elements that mediate between different manufacturing processes. These patterns are formed on specific layers (such as the organic insulating layer) and serve as intermediate reference structures that guide the alignment of subsequent layers, enabling precise multi-layer fabrication without direct measurement between distant layers.

The patent implements an alignment verification mechanism where alignment patterns are formed and then used to verify the positional accuracy of subsequent layers. The overlay alignment process provides feedback on alignment quality, allowing for correction or rework if alignment specifications are not met, thereby ensuring display quality without excessively increasing manufacturing complexity.

The patent replaces complex mechanical alignment systems with a pattern-based optical alignment approach. Instead of relying on complex mechanical positioning equipment, the invention uses photolithographically formed alignment patterns that can be detected and measured optically, simplifying the alignment mechanism while maintaining or improving precision.