OLEDoS Pixel Electrode Layout With Single-Mask Patterning

The patent merges the patterning of connection electrodes, reflective electrodes, and optical auxiliary films into a single mask process. Multiple layers are patterned simultaneously through one mask, reducing the number of separate manufacturing steps while maintaining high-resolution requirements. This combines multiple patterning operations that would traditionally require separate masks and processes into a unified step.

The single mask serves multiple functions by simultaneously defining the patterns for connection electrodes, reflective electrodes, and optical auxiliary films. This universal mask approach allows one component to perform multiple patterning tasks that would traditionally require separate dedicated masks for each layer, simplifying the manufacturing process while achieving high-resolution patterns.

The patent combines multiple sequential mask processes into a single integrated mask process. The connection electrodes, reflective electrodes, and optical auxiliary films are all patterned in one step rather than through multiple separate masking operations, reducing manufacturing time and increasing productivity while preserving patterning precision through careful mask design.

The single mask is designed in advance to accommodate all necessary patterning requirements for multiple layers. By performing preliminary design and preparation of a comprehensive mask that covers all patterning needs, the process eliminates the need for multiple sequential masking steps, thereby improving manufacturing efficiency without sacrificing precision.

The patent merges multiple patterning steps into a single mask process, reducing the total number of manufacturing operations required. This consolidation decreases material consumption, reduces equipment usage time, and lowers labor costs while maintaining the necessary patterning precision through optimized mask design and single-step processing.

The single mask serves as a master template that simultaneously copies the required patterns onto multiple layers (connection electrodes, reflective electrodes, and optical auxiliary films). This copying approach allows one mask to produce multiple identical or related patterns across different layers, reducing the need for multiple unique masks and associated costs.