Omnidirectional Structured Light Projection Using Pattern Mask
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Solution Overview
Problem
Conventional structured light projection systems using conical mirrors suffer from deformation patterns that result in unsuitable point distributions for scanning applications, leading to inefficient object location determination in environments.
Innovation Solution
An apparatus comprising a conical mirror and a pattern mask, where the light source illuminates the conical mirror along its central axis, and the pattern mask corrects the deformation pattern to form a precise point cloud suitable for scanning by adjusting the distribution of light rays reflected from the conical mirror.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conical mirror is used for structured light projection, then omnidirectional projection capability is achieved, but deformation pattern causes unsuitable point distribution
Solution Approach 1:
The pattern mask introduces local variations in the optical path by selectively blocking or transmitting light rays at different positions. This creates non-uniform point distribution patterns that compensate for the conical mirror's deformation, achieving accurate point clouds in specific regions while maintaining omnidirectional coverage.
Solution Approach 2:
The pattern mask acts as an intermediary element between the light source and the conical mirror. It pre-modulates the light pattern before reflection, correcting the deformation caused by the conical mirror geometry and producing the desired point distribution in the final projection.
2Device complexity
If conventional structured light projection is used, then system simplicity is maintained, but object location determination efficiency is reduced
Solution Approach 1:
The pattern mask pre-corrects the light distribution pattern before the light reaches the target object. By anticipating and compensating for the conical mirror's deformation in advance, the system achieves accurate point clouds without requiring complex post-processing or additional correction mechanisms, thus improving efficiency while maintaining simplicity.
3Device complexity
If the conical mirror deformation pattern is used directly, then device complexity is minimized, but measurement precision of point cloud is degraded
Solution Approach 1:
The pattern mask changes the spatial distribution parameters of the light rays by introducing controlled variations in transmission or blocking. This modifies the point distribution pattern to compensate for the conical mirror's geometric deformation, achieving accurate point clouds without altering the mirror's simple conical geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the generation of a point cloud with a desired point distribution, enhancing the accuracy and effectiveness of object location determination in scanning applications, making it suitable for various environmental scanning needs.
Implementation Method 1
A light source illuminates the conical mirror towards the apex along a central axis
Implementation Method 2
The pattern mask corrects a deformation pattern of the conical mirror to form a plurality of points in a point cloud
Data Source
AI summary
For omnidirectional structured light projection, a light source illuminates a conical mirror towards an apex along a central axis. A pattern mask corrects a deformation pattern of the conical mirror to form a plurality of points in a point cloud from the light source.