On-Wafer S Parameter Calibration Using Crosstalk Error Segmentation

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Solution Overview

Problem

Traditional 12-term and 8-term system error models are inaccurate for calibrating on-wafer S parameters at high-frequency bands, leading to significant errors in vector network analyzers.

Innovation Solution

A calibration method that involves acquiring and correcting main and secondary crosstalk error terms using crosstalk calibration pieces to improve the accuracy of on-wafer S parameter calibration, employing algorithms to calculate and apply these error terms for precise measurement correction.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional 12-term or 8-term system error models are used for calibration, then the calibration is simple and widely applicable, but the measurement precision deteriorates at high-frequency bands due to neglected system errors

Engineering Contradiction:
Improveon-wafer S parameter calibration accuracyVSAvoidcalibration system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent segments the error correction process into multiple stages: first applying traditional 12-term or 8-term error models, then separately correcting crosstalk errors, and finally addressing residual errors. This segmentation allows each error type to be handled independently with appropriate methods, improving overall precision without requiring a complete overhaul of the calibration system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary error characterization by measuring crosstalk calibration pieces before actual measurements. The crosstalk error terms are pre-calculated and stored, then applied during measurement to correct the data. This preliminary action separates error characterization from measurement, improving precision while maintaining operational simplicity.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If traditional error models are used, then the calibration process is fast and simple, but the reliability of measurement results deteriorates at high frequencies due to significant crosstalk errors

Engineering Contradiction:
Improvemeasurement result accuracyVSAvoidcalibration time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent performs preliminary measurement of crosstalk calibration pieces to characterize error terms before actual measurements. These pre-calculated error terms are then applied during measurement to correct data, ensuring reliability without adding significant time to the measurement process itself.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses crosstalk calibration pieces that replicate the physical configuration of actual measurements but with known characteristics. By measuring these copies, the system obtains error terms that can be applied to correct actual measurements, ensuring reliability through standardized reference structures.

Inventive Principle:
Principle #26Copying

3Measurement precision

If simple error correction is applied, then the operation is easy and quick, but the measurement precision worsens due to residual crosstalk errors that are not fully corrected

Engineering Contradiction:
ImproveS parameter calibration precisionVSAvoidcalibration operation simplicity
Core Design Contradiction:
Measurement precisionVSEase of operation

Solution Approach 1:

The patent segments error correction into distinct stages: primary error correction using traditional models, then crosstalk correction, and finally residual error correction. Each stage builds on the previous one, systematically eliminating different error types. This segmented approach maintains operational simplicity by providing a clear sequential process while achieving high precision through comprehensive error addressing.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements feedback by measuring crosstalk calibration pieces, calculating error terms, applying corrections, and then measuring additional calibration pieces to determine residual errors. This feedback loop allows the system to assess the effectiveness of corrections and apply further adjustments, improving precision while maintaining ease of operation through automated iterative correction.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS11275103B2Calibration method, system and device of on-wafer s parameter of vector network analyzer
Publication Date: 2022.03.15 THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
  • US11275103B2 patent drawing
  • US11275103B2 patent drawing
  • US11275103B2 patent drawing

AI summary

The disclosure provides a calibration method, a system and a device of an on-wafer S parameter of a vector network analyzer. The method comprises the steps of: acquiring a first parameter of a first crosstalk calibration piece measured by the vector network analyzer; obtaining a main crosstalk error term based on the first parameter of the first crosstalk calibration piece and a calibration parameter of the first crosstalk calibration piece; acquiring a second parameter of a second crosstalk calibration piece measured by the vector network analyzer based on the main crosstalk error term; and obtaining a secondary crosstalk error term based on the second parameter of the second crosstalk calibration piece and a calibration parameter of the second crosstalk calibration piece, wherein the main crosstalk error term and the secondary crosstalk error term are used for calibrating the vector network analyzer.