On-Wafer Voltage Generation for Capacitance-Based Process Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor manufacturing processes lack effective methods for detecting and adjusting out-of-control conditions to minimize process variability, necessitating improved process control systems.
Innovation Solution
A system is introduced that includes a voltage generator and regulator circuit to generate and regulate voltages for function circuits, utilizing capacitors formed by metal structures and electrodes to sense on-wafer parameters and adjust process conditions, with enabling circuits and switches to control voltage transmission.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a voltage generator and regulator circuit are integrated into the semiconductor device, then process control capability is improved through on-wafer parameter sensing, but device complexity increases
Solution Approach 1:
The voltage generator circuit performs multiple functions: it generates control voltages for the electrostatic chuck, senses on-wafer parameters through capacitance measurement, and provides voltage regulation. This multi-functionality integrates process control capabilities directly into the semiconductor device, improving reliability while managing complexity through functional consolidation.
Solution Approach 2:
The patent uses capacitance as an intermediary parameter to sense on-wafer conditions. The voltage generator measures capacitance between the electrostatic chuck electrode and the wafer, which indirectly provides information about wafer parameters without requiring direct physical contact or additional complex sensing hardware.
2Measurement precision
If capacitance-based sensing is used to detect on-wafer parameters, then measurement precision is improved, but the system requires additional voltage regulation circuits increasing device complexity
Solution Approach 1:
The voltage regulator circuit is merged with the voltage generator circuit, sharing common components and integration structures. This combining approach enables precise capacitance-based sensing while minimizing the increase in device complexity through shared circuitry and integrated design.
3Manufacturing precision
If voltage is transmitted through switches and enabling circuits to control function circuits, then process control precision is improved, but response time increases due to additional control stages
Solution Approach 1:
The voltage generator circuit prepares and pre-charges capacitance values before they are needed for process control. By pre-establishing the voltage levels and capacitance states, the system reduces transmission delays when actual process control actions are required, maintaining both precision and responsiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances process control by accurately sensing and responding to on-wafer parameters, thereby minimizing process variability and improving manufacturing consistency.
Implementation Method 1
the capacitor is charged in response to the voltage of the electrode
Data Source
AI summary
A device in a chamber is provided. The device comprises at least one die. The at least one die comprise a first voltage generator, a dielectric layer and a first voltage regulator circuit. The first voltage generator is charged to have a first induced voltage by induced charges generated in response to a first voltage of a first electrode of a chuck in the chamber. The dielectric layer surrounds the first voltage generator to isolate the first voltage generator from the first electrode. The first voltage regulator circuit is coupled to the first voltage generator to receive the first induced voltage and generates a first power supply voltage according to the first induced voltage for a first circuit in the device.