Onium Salt Monomer Resist Composition for High-Sensitivity EUV Patterning
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Solution Overview
Problem
Existing chemically amplified resist materials face challenges in achieving high sensitivity, high resolution, and high contrast, particularly in applications such as KrF excimer laser light, ArF excimer laser light, and electron beam applications.
Innovation Solution
A polymer containing a repeat unit derived from an onium salt monomer with specific chemical and structural formulations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an acid diffusion distance is shortened, then LWR is decreased, but sensitivity is lowered
Solution Approach 1:
The invention changes the chemical structure parameters of the photoacid generator by introducing specific fluorine atom configurations and aromatic ring structures, which modifies the acid diffusion characteristics while maintaining high sensitivity. The fluorine atoms create a more compact molecular structure that limits acid diffusion distance without requiring physical constraints.
Solution Approach 2:
The photoacid generator combines multiple functional components: iodine atoms for EUV absorption, fluorine atoms for solubility and diffusion control, aromatic rings for structural stability, and sulfonic acid groups for acid generation. This composite molecular structure achieves both high sensitivity and low LWR simultaneously.
2Productivity
If the addition amount of an addition-type acid generator is increased, then sensitivity is increased, but acid diffusion distance is increased, causing LWR and CDU to deteriorate
Solution Approach 1:
The invention changes the molecular weight and structural parameters of the photoacid generator by using a polymeric structure with repeating units. This increases the molecular size and reduces acid diffusion distance even when the addition amount is increased, thereby maintaining both high sensitivity and low LWR.
Solution Approach 2:
The photoacid generator is segmented into repeating polymeric units, each containing the functional groups needed for acid generation. This segmentation allows the acid to be generated at multiple localized sites along the polymer chain, reducing overall diffusion distance while maintaining high sensitivity through increased acid generation capacity.
3Productivity
If an iodine atom is introduced to improve EUV absorption, then lithographic performance is improved, but organic solvent solubility decreases, causing deposition concerns
Solution Approach 1:
The invention creates a composite molecular structure where iodine atoms (for EUV absorption) are combined with fluorine atoms and aromatic rings (for solubility). The fluorine atoms introduce polarity and the aromatic rings provide structural organization, both of which enhance organic solvent solubility while the iodine atoms maintain high EUV absorption capability.
Solution Approach 2:
Different parts of the photoacid generator molecule have different functional qualities: iodine atoms localized for EUV absorption, fluorine atoms localized for solubility enhancement, and aromatic rings localized for structural stability. This local differentiation allows each component to optimize its specific function without compromising the others.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer provides high sensitivity and high contrast, and high resolution, particularly in KrF excimer laser light, ArF excimer laser light, electron beam, and EUV applications.
Implementation Method 1
an iodine atom has very large absorption of EUV of a wavelength of 13.5 nm, an effect of generating secondary electrons from the iodine atom during exposure has been confirmed
Implementation Method 2
a polymeric sulfonic acid is generated by exposure
Data Source
AI summary
Provided are: an onium salt monomer used in a chemically amplified resist composition that is excellent in solvent solubility and has high sensitivity and high contrast in photolithography using a high energy ray, is excellent in lithographic performance of EL, LWR, CDU, DOF, or the like, is resistant to pattern collapse even in fine pattern formation, and is excellent in etching resistance; a polymer containing a repeat unit derived from the onium salt monomer; a chemically amplified resist composition containing the polymer; and a pattern forming method using the chemically amplified resist composition.An onium salt monomer having the following formula (a):