Synthetic Opaque Quartz Glass High-Pressure Bubble Formation
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Solution Overview
Problem
Conventional methods for producing opaque quartz glass are labor-intensive, limit the size of the glass, and result in contamination and foaming issues during flame processing, making them unsuitable for high-purity applications like semiconductor production.
Innovation Solution
Producing opaque quartz glass by heating a quartz glass porous body under high pressure (0.05 MPa or higher) at temperatures between 1200°C to 2000°C, preferably in an inert gas atmosphere, to achieve high purity and large-sized glass with uniform bubbles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional methods are used to produce opaque quartz glass, then production is possible, but the process requires considerable labor and limits the size of the glass
Solution Approach 1:
The patent changes the pressure parameter from conventional atmospheric or vacuum conditions to high pressure (0.05-1000 MPa). This parameter change enables both simplified production and the manufacture of large-sized opaque quartz glass by heating the porous body under high pressure to form uniform bubbles throughout the material.
2Ease of manufacture
If conventional opaque quartz glass is used, then production is achieved, but contamination from the surface is heavy
Solution Approach 1:
The patent uses a porous quartz glass body as the starting material, which allows for uniform bubble distribution throughout the material. This porous structure enables the formation of consistent internal bubbles during high-pressure heating, resulting in uniform opacity and high surface purity suitable for semiconductor applications.
3Ease of operation
If nitrogen is added during flame processing of conventional opaque quartz glass, then processing is possible, but the glass partially foams and easily breaks
Solution Approach 1:
The patent changes the pressure parameter to high pressure (0.05-1000 MPa) during the heating process. This high-pressure condition prevents nitrogen from forming bubbles during subsequent flame processing, allowing the glass to maintain its strength while still being amenable to flame processing operations.
Solution Approach 2:
The high-pressure heating process pre-establishes a dense, uniform bubble structure that prevents further bubble formation during flame processing. This preliminary action counteracts the potential harmful effect of nitrogen addition, maintaining glass strength while enabling flame processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method allows for high-purity flame processing and large-sized opaque quartz glass with excellent shading effects, maintaining purity and processability, making it suitable for industrial applications, particularly in semiconductor manufacturing.
Implementation Method 1
heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200° C. to 2000° C.
Implementation Method 2
heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa
Data Source
AI summary
Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass. A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200 ° C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.