Optical Proximity Correction Edge Fragmentation and Adjustment
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Solution Overview
Problem
The optical proximity correction (OPC) process in semiconductor manufacturing often results in mismatched edge segments during the fragmentation and merging of feature patterns, leading to time-consuming and costly corrections.
Innovation Solution
A method involving the use of templates and calculation zones to fragment and adjust edge segments of feature patterns, ensuring that beginning segments are equal in length and adjusted to prevent mismatches during the merging process, thereby facilitating accurate merging of adjusted segments across different processing units.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If edges of the feature pattern are fragmented by dividing into several edge segments during OPC process, then the optical proximity correction can be applied to each segment, but the corresponding edge segments from two independent OPC processes are often mismatched during merging
Solution Approach 1:
The patent applies preliminary action by defining calculation zones that overlap the entire template and portions of feature patterns outside the template before the OPC process. This preliminary setup ensures that when edges are fragmented and corrected by independent OPC processes, the beginning segments at the common boundary are generated with consistent reference points, preventing mismatches during merging and eliminating the need for time-consuming correction.
2Productivity
If the pitch is scaled down to achieve finer device size, then the integration of semiconductor devices increases, but diffraction and interference occur when light passes through the mask
Solution Approach 1:
The patent applies segmentation by dividing the feature pattern edges into multiple edge segments at defined reference points within overlapping calculation zones. This segmentation allows independent OPC processing of each segment while maintaining control over the fragmentation points, enabling fine pitch processing without suffering from diffraction and interference effects that would otherwise degrade resolution.
Solution Approach 2:
The patent introduces calculation zones as intermediary structures that overlap the entire template and extend into adjacent templates. These calculation zones serve as mediators that provide a common reference framework for fragmenting edges and generating beginning segments, ensuring that corrections applied to fine-pitch features do not cause mismatches at template boundaries.
3Productivity
If two independent OPC processes are used to correct the same edges of the polygon, then the correction can be performed in parallel, but the corresponding two edge segments are often mismatched in the following merging process
Solution Approach 1:
The patent applies preliminary action by pre-defining calculation zones that overlap templates and feature patterns before parallel OPC processing begins. This preliminary setup establishes consistent reference points and fragmentation rules that both independent OPC processes follow, ensuring that beginning segments generated at common boundaries match perfectly during merging, thus maintaining high precision despite parallel processing.
Data Source
AI summary
A calculation method of optical proximity correction includes providing at least a feature pattern to a computer system. At least a first template and a second template are defined so that portions of the feature pattern are located in the first template and the rest of the feature pattern is located in the second template. The first template and the second template have a common boundary. Afterwards, a first calculation zone is defined to overlap an entire first template and portions of the feature pattern out of the first template. Edges of the feature pattern within the first calculation zone are then fragmented from the common boundary towards two ends of the feature pattern so as to generate at least two first beginning segments respectively at two sides of the common boundary. Finally, positions of the first beginning segments are adjusted so as to generate first adjusted segments.