Optical Proximity Correction Mask for Color Filter Light Leaking
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Solution Overview
Problem
Conventional color filters in LCDs suffer from optical proximity effects, leading to light leaking regions that severely affect color display quality, especially as pixel sizes decrease.
Innovation Solution
An optical proximity correction mask is used, featuring a substrate with a mask pattern and a mending pattern, including serifs or internal assisted lines, to reduce light leaking by precisely transferring patterns during photolithography, eliminating gaps between color filtering units.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography is used to fabricate color filters, then the fabrication process is simple, but optical proximity effects cause rounding corners and light leaking regions that severely affect color display quality
Solution Approach 1:
The patent applies preliminary action by pre-compensating for optical proximity effects during mask design. The mask pattern is deliberately designed with modified dimensions and shapes that will counteract the expected rounding and light leaking during photolithography, ensuring the final transferred pattern matches the desired geometry without requiring complex post-processing
Solution Approach 2:
The patent applies local quality by introducing different pattern modifications at different locations on the mask. Specifically, the mask pattern includes adjusted dimensions and shapes at critical areas such as corners and edges where optical proximity effects are most pronounced, while maintaining standard patterns in less critical regions
2Measurement precision
If pixel size is reduced to increase resolution, then display resolution improves, but light leaking regions severely affect color displaying
Solution Approach 1:
The patent applies preliminary anti-action by designing the mask pattern to pre-counteract the optical proximity effects that would otherwise cause light leaking in reduced-pixel-size displays. The mask incorporates compensatory dimensional adjustments and shape modifications that directly oppose the expected pattern degradation during lithography of small features
Solution Approach 2:
The patent applies parameter changes by modifying the mask pattern dimensions, shapes, and geometries to account for the reduced pixel size. The mask design adjusts critical dimensions and shapes based on the specific pixel dimensions being fabricated, optimizing the pattern transfer for high-resolution displays while compensating for enhanced optical proximity effects at smaller scales
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces optical proximity effects, improving pattern transfer precision and eliminating light leaking regions, thereby enhancing color display quality and resolution in LCDs.
Implementation Method 1
due to affecting of the optical proximity effect, the formation for the red color filtering unit 102, the green color filtering unit 104, and the blue color filtering unit 106 may cause a rounding comer, and it further cause a light leaking regions
Data Source
AI summary
An optical proximity correction mask used for fabricating a color filter includes a substrate, a mask pattern and a mending pattern. Wherein, the mask pattern is disposed on the substrate. The mask pattern and the transferred pattern, being transferred to the color filter, are not matched and cause occurrence of a light leaking region in the color filter. The mending pattern is disposed over the substrate around the periphery of the mask pattern and corresponds to the light leaking region.