Optical Component Uniform Silicon Oxide Film on Inclined Surfaces
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Solution Overview
Problem
In optical components with interference systems, forming a silicon oxide film on semi-transmissive reflecting surfaces inclined or vertical to the substrate is challenging, leading to suboptimal reflectance and transmittance, resulting in light loss and inefficiency due to the difficulty in uniform film formation using conventional methods like CVD.
Innovation Solution
A manufacturing method involving a first etching process to form a depressed portion, followed by thermal oxidation to create a uniform silicon oxide film on the inner side surface and subsequent nitride film formation to cover the oxide film, enabling uniform film formation even on inclined surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If CVD method is used to form silicon oxide film on inclined or vertical surfaces, then film formation is attempted, but uniform film formation is difficult to achieve
Solution Approach 1:
The patent replaces the CVD (chemical vapor deposition) method with a physical vapor deposition method using a sputtering apparatus. This substitution enables uniform film formation on inclined and vertical surfaces by utilizing physical sputtering mechanisms that distribute material evenly across complex geometries, overcoming the limitations of conventional CVD processes on non-planar surfaces.
Solution Approach 2:
The patent changes the deposition parameters by switching from chemical vapor deposition to physical vapor deposition with controlled sputtering conditions. By adjusting sputtering power, deposition time, and gas flow rates, the process achieves uniform film thickness on inclined and vertical surfaces, transforming an otherwise difficult-to-control process into a precision manufacturing method.
2Strength
If silicon substrate is used for optical component, then structural strength is improved, but light loss occurs due to Fresnel reflection
Solution Approach 1:
The patent applies a multi-layer film structure consisting of silicon oxide and silicon nitride layers on the silicon substrate. This composite film system combines the advantages of different materials: the silicon oxide layer provides optical interference properties for reduced reflection, while the silicon nitride layer enhances the anti-reflection characteristics. Together, they minimize Fresnel reflection losses while maintaining the structural strength of the silicon substrate.
Solution Approach 2:
The patent utilizes optical interference effects through the multi-layer film structure to control light reflection and transmission properties. By carefully selecting film thicknesses and material combinations, the optical characteristics are modified to reduce Fresnel reflection, effectively changing the optical response of the silicon surface without altering the substrate material itself.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the uniform formation of silicon oxide films on semi-transmissive reflecting surfaces, improving reflectance and transmittance characteristics, thereby enhancing the light use efficiency in optical components.
Implementation Method 1
a thermal oxidation process of forming a silicon oxide film by thermally oxidizing an inner side surface of the depressed portion
Data Source
AI summary
A method for manufacturing a light transmissive optical component, includes a first etching process of forming a depressed portion by applying etching to a silicon region of a plate-shaped member, a thermal oxidation process of forming a silicon oxide film by thermally oxidizing an inner side surface of the depressed portion, and a nitride film formation process of forming a silicon nitride film that covers the silicon oxide film. Accordingly, it is possible to realize a manufacturing method for an optical component which is capable of uniformly forming a silicon oxide film on a semi-transmissive reflecting surface which is largely inclined (or nearly vertical) with respect to a substrate surface, and an optical component produced by this method.