Optical Element Fabrication via Patterned Organic Grid Protection
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Solution Overview
Problem
Conventional fabrication methods for optical elements with dual grid shifting often damage metal grids during the etching process due to lack of proper protection, which compromises the optical performance of edge pixels.
Innovation Solution
A two-stage etching process is employed, where an organic layer is first formed over the metal grids and etched to create a patterned layer that protects the grids during subsequent etching, using specific mask designs and etching gases to prevent damage and achieve dual grid shifting without exposing the metal grids.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a mask layer is formed on the guiding film and etching is performed until the substrate is exposed, then the wave-guiding structure is formed, but the metal grids are damaged during the etching process due to lack of proper protection
Solution Approach 1:
The patent applies preliminary action by forming a protective organic layer on the metal grids before the etching process begins. This organic layer is patterned to create protrusion portions that extend over the metal grids, providing protection in advance before any damage can occur during etching. The protective layer is prepared beforehand to ensure the metal grids remain intact throughout the subsequent etching steps.
Solution Approach 2:
The patent uses an organic layer as an intermediary protective element between the etching process and the metal grids. This organic layer acts as a mediator that absorbs or deflects the harmful effects of the etching process, preventing direct contact between the etchant and the metal grids. The intermediary layer is strategically positioned to cover the metal grids while allowing the etching to proceed to form the desired wave-guiding structure.
2Manufacturing precision
If the metal grids are exposed from the guiding film during etching, then the wave-guiding structure can be formed, but the optical performance of edge pixels deteriorates due to metal grid damage
Solution Approach 1:
The patent applies preliminary action by forming a protective organic layer on the metal grids before the etching process begins. This organic layer is patterned to create protrusion portions that extend over the metal grids, providing protection in advance before any damage can occur during etching. The protective layer is prepared beforehand to ensure the metal grids remain intact throughout the subsequent etching steps.
Solution Approach 2:
The patent uses an organic layer as an intermediary protective element between the etching process and the metal grids. This organic layer acts as a mediator that absorbs or deflects the harmful effects of the etching process, preventing direct contact between the etchant and the metal grids. The intermediary layer is strategically positioned to cover the metal grids while allowing the etching to proceed to form the desired wave-guiding structure.
3Adaptability or versatility
If dual grid shifting is implemented to receive incident light from various angles, then optical performance is improved, but the fabrication process becomes more complex requiring precise protection mechanisms
Solution Approach 1:
The patent applies preliminary action by forming a protective organic layer on the metal grids before the etching process begins. This organic layer is patterned to create protrusion portions that extend over the metal grids, providing protection in advance before any damage can occur during etching. The protective layer is prepared beforehand to ensure the metal grids remain intact throughout the subsequent etching steps.
Solution Approach 2:
The patent uses an organic layer as an intermediary protective element between the etching process and the metal grids. This organic layer acts as a mediator that absorbs or deflects the harmful effects of the etching process, preventing direct contact between the etchant and the metal grids. The intermediary layer is strategically positioned to cover the metal grids while allowing the etching to proceed to form the desired wave-guiding structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively prevents damage to the metal grids while maintaining optical performance by ensuring the grids remain protected throughout the etching process, allowing for controlled dual grid shifting to accommodate various light incidence angles.
Implementation Method 1
The organic layer is etched to form a first patterned organic layer including a plurality of first protrusion portions and a plurality of first trenches surrounded by the first protrusion portions. The first patterned organic layer is etched to form a second patterned organic layer including a plurality of second protrusion portions and a plurality of second trenches surrounded by the second protrusion portions.
Data Source
AI summary
A method for fabricating an optical element is provided. A substrate is provided. A plurality of metal grids are formed on the substrate. An organic layer is formed on the substrate and the metal grids. The organic layer is etched to form a first patterned organic layer including a plurality of first protrusion portions and a plurality of first trenches surrounded by the first protrusion portions. The first patterned organic layer is etched to form a second patterned organic layer including a plurality of second protrusion portions and a plurality of second trenches surrounded by the second protrusion portions. Each second protrusion portion covers one metal grid. There is a distance between the center axis of one second protrusion portion of the second patterned organic layer and the center axis of one metal grid covered by the one second protrusion portion of the second patterned organic layer.