Optical Element Antireflection via Wavelength-Scale Pitch
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Solution Overview
Problem
Existing optical elements with sub-wavelength concave and convex structures struggle to achieve further reduction in reflectance beyond the 0.3% or less reflectance threshold, necessitating improved antireflection characteristics and manufacturing methods.
Innovation Solution
Increasing the arrangement pitch of convex or concave structures on the optical element surface to 380 nm to 680 nm and adjusting the aspect ratio to 0.62 to 1.09, combined with a manufacturing method involving laser light exposure and etching to form quasi-hexagonal lattice patterns, enhances antireflection efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the arrangement pitch of structures is reduced to improve antireflection characteristic, then the antireflection effect is enhanced, but the manufacturing precision and structure definition become more difficult to control
Solution Approach 1:
The patent changes the arrangement pitch parameter from sub-wavelength scale to wavelength-scale (380-680 nm), and adjusts the aspect ratio parameter (0.62-1.09) to achieve optimal antireflection effect while improving manufacturability and structure control
Solution Approach 2:
Instead of continuously reducing the pitch to improve antireflection, the patent inverts the approach by increasing the pitch to wavelength-scale, achieving the desired optical effect while avoiding the manufacturing precision problems associated with sub-wavelength structures
2Reliability
If conventional sub-wavelength structures are used to achieve antireflection effect, then light transmission is improved, but further reduction of reflectance beyond 0.3% is difficult to achieve
Solution Approach 1:
The patent changes the pitch parameter from sub-wavelength to wavelength-scale (380-680 nm) and optimizes the aspect ratio (0.62-1.09), enabling further reflectance reduction beyond the 0.3% threshold achieved by conventional sub-wavelength structures
3Reliability
If complex manufacturing processes are used to achieve precise sub-wavelength structures, then the antireflection effect is improved, but the productivity and manufacturing efficiency decrease
Solution Approach 1:
By changing the pitch to wavelength-scale (380-680 nm) and optimizing aspect ratio (0.62-1.09), the patent enables standard manufacturing processes to achieve the desired antireflection effect, eliminating the need for complex sub-wavelength fabrication processes and improving productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The approach results in a significant reduction in reflectance, achieving excellent antireflection characteristics and high transmission factors, while also improving durability and productivity through efficient manufacturing processes.
Implementation Method 1
forming a latent image by applying laser light to the resist layer intermittently while the substrate is rotated
Implementation Method 2
forming a resist pattern on the surface of the substrate by developing the resist layer
Implementation Method 3
applying laser light to the resist layer intermittently while the substrate is rotated and the laser light is moved relatively in a direction of the rotation radius
Data Source
AI summary
An optical element has a plurality of structures including convex portions or concave portions arranged on a base member surface, wherein the arrangement pitch of the structures is 380 nm to 680 nm and the aspect ratio of the structure is 0.62 to 1.09.