Real-Time Micro/Nano Optical Field Manipulation System

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Solution Overview

Problem

Current interference lithography systems are unable to fabricate micro/nano structures with real-time adjustable parameters such as period, orientation, and duty cycle, limiting their application in novel devices like true color 3D displays and metasurface materials.

Innovation Solution

A real-time micro/nano optical field generation and manipulation system incorporating a light source, spatial filtering unit, and optical 4F system with a light wave manipulation unit that modulates incident light waves, allowing for continuous adjustment of pattern composition, position, area, and structural parameters using phase elements and spatial filtering techniques like time division and spatio-temporal multiplexing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If traditional interference lithography systems are used, then micro/nano structures can be fabricated with fixed structural parameters, but the parameters cannot be adjusted in real-time

Engineering Contradiction:
Improvereal-time adjustability of structural parametersVSAvoidoptical configuration complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent transforms the static optical configuration into a dynamic system by introducing a spatial light modulator that can real-time adjust the wavefronts of interference beams. This allows the structural parameters (period, orientation, duty cycle) to be dynamically changed without physically reconfiguring the entire optical system, thus achieving real-time adaptability while controlling complexity through electronic control of the SLM.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent utilizes the spatial light modulator to change the phase and amplitude parameters of the light waves in real-time. By modulating the wavefront parameters digitally, the system can adjust structural parameters such as period, orientation, and duty cycle without mechanical movement or physical reconfiguration, achieving parameter adaptability through electronic parameter control.

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If discrete manipulation of spatial frequencies is used by switching gratings, then frequency control is achieved, but continuous real-time adjustment is not possible

Engineering Contradiction:
Improvecontinuous frequency adjustmentVSAvoidtime for parameter switching
Core Design Contradiction:
Adaptability or versatilityVSLoss of time

Solution Approach 1:

The patent replaces the mechanical grating switching system with an electronic spatial light modulator. Instead of physically switching between different grating elements, the SLM electronically modulates the phase and amplitude of light waves to achieve continuous frequency adjustment. This substitution eliminates mechanical movement and switching time, enabling real-time continuous parameter control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent transforms the discrete grating switching into a continuous dynamic control system. The spatial light modulator can continuously adjust the spatial frequency parameters by varying the phase modulation pattern across the light wavefront, allowing smooth transitions between different frequencies without discrete switching steps or time delays.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the flexible and real-time fabrication of micro/nano structures with adjustable structural parameters, enhancing the capabilities of lithography systems and microscopic applications.

Implementation Method 1

the spatial filtering unit is located in front of or at the back of the optical 4F system, which manipulates an incident light wavefront, or/and selects light wave manipulation unit or/and the pixel's effective area, or/and filters optical field in the image plane

Methodology Applied
Scientific EffectSpatial filtering: Spatial Filter

Implementation Method 2

Interference lithography or holographic lithography is an efficient fabrication technique for a large area micro/nano structure, and the period of the micro/nano structure fabricated by the interference lithography is determined by the wavelength and intersection angle of interference beams

Methodology Applied
Scientific EffectInterference: Interference

Implementation Method 3

the light wave manipulation unit is arranged between the first lens (set) and a second lens (set), which modulates incident lights or its sub-wavefronts separately

Methodology Applied
Scientific EffectPhase modulation: Phase Modulation

Data Source

PatentUS11327326B2Real-time micro/nano optical field generation and manipulation system/method
Publication Date: 2022.05.10 SUZHOU UNIV
  • US11327326B2 patent drawing
  • US11327326B2 patent drawing
  • US11327326B2 patent drawing

AI summary

The present disclosure discloses a real-time micro/nano optical field generation and manipulation system and method. The system comprises a light source, a spatial filtering unit, an optical 4F system and a light wave manipulation unit, and the optical 4F system comprises a first lens (set) and a second lens (set) sequentially arranged along a light path. The present disclosure achieves real-time modulation on an incident wavefront through a phase element or a phase element assemble. By dynamically manipulating an incident light sub-wavefront, or the light wave modulation optical element, or different areas of the optical element, or different parts of the optical field in an imaging plane and/or the like by the spatial filtering unit, real time light fields with different parameters are generated in the image plane of the system. By spatial filtering/spatial time division filtering/spatio-temporal multiplexing filtering and/or the change of the phase elements, flexible manipulation on patterns, pattern distribution areas and structural parameters such as the patterns' frequency, their orientations, duty ratios, phases or phase shifts and the like are realized. The system can be flexibly integrated into various lithography or microscopy systems for real-time micro/nano structure fabrication and dynamical or 3D detection with a real time manipulated structural illumination.