Optical Film Coating Edge Pattern for Ghost Image Reduction
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Solution Overview
Problem
Existing optical films suffer from strong reflected light interference, leading to ghost images and poor image quality due to linear coating lines, which conventional methods like enlarging the substrate or using annular masks fail to adequately address.
Innovation Solution
The optical film features a non-linear zigzag or multi-curved coating line pattern, which reduces reflected light intensity and controls light direction, achieved through processes like photo-resist coating and exposure to form an annular mask with a zigzag inner edge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a linear coating line is used for the optical film, then the manufacturing process is simple, but strong reflected light is generated causing ghost images and poor image quality
Solution Approach 1:
The patent applies curvature by replacing the traditional linear coating line with a zigzag or multi-curved pattern. This curved configuration causes incident light to reflect in multiple directions rather than forming a concentrated reflected beam, thereby reducing ghost images and light interference while maintaining manufacturing feasibility through standard coating processes.
2Object-affected harmful factors
If the substrate area is enlarged to move the coating line away from the photosensitive element, then the reflected light influence is reduced, but the cost of electronic components increases
Solution Approach 1:
The patent applies local quality by modifying only the coating line pattern in the peripheral region of the optical film, while keeping the central optical area unchanged. The zigzag or multi-curved pattern is locally applied to the coating line to reduce reflected light, without requiring enlargement of the entire substrate, thus controlling costs while addressing the harmful reflected light.
3Object-affected harmful factors
If an annular mask is added to shield the peripheral coating line, then the coating line reflection is blocked, but new reflected light is generated at the mask's inner edge
Solution Approach 1:
The patent extracts or removes the need for an annular mask by directly patterning the coating line itself into a zigzag or multi-curved configuration. This eliminates the additional component (mask) that would create its own edge reflections, while still achieving the goal of reducing coating line reflection through the curved pattern design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively minimizes ghost images and improves picture quality by reducing stray light impact on photosensitive elements, applicable to various substrates and film thicknesses.
Implementation Method 1
Anti-scattering and anti-interference coating pattern structure
Implementation Method 2
Thin-film interference will affect the refraction and light transmission characteristics of optical materials
Implementation Method 3
achieved through processes like photo-resist coating and exposure to form an annular mask with a zigzag inner edge
Implementation Method 4
the process generally uses physical vapor deposition or chemical vapor deposition such as evaporation or sputtering deposition
Data Source
AI summary
An anti-scattering and anti-interference coating pattern structure of an optical film, wherein an optical film is formed on a substrate, the characterize is: the periphery of the optical film is a non-straight zigzag lines or multi-curved inner edge lines, such that can be used to reduce stray light affecting the sensing area when it is used in light-sensing components.