Optical Guiding Apparatus for Automated Sewing Path Correction

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Solution Overview

Problem

Existing systems for guiding items along a predetermined path on substrates, such as textiles, require significant manual intervention, are limited to specific styles and depths, and lack real-time self-correction capabilities.

Innovation Solution

A guiding apparatus equipped with optical and other sensors, lighting units, and a controller that calibrates and automatically controls a sewing machine to stitch along a self-guided path, integrating with sewing machines to detect materials, determine sewing paths, and validate stitch integrity in real-time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If manual intervention is used to guide items along a path, then the system is simple to operate, but productivity is low and manual labor is intensive

Engineering Contradiction:
Improvestitching productivityVSAvoidguiding system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent replaces manual mechanical guiding with an optical sensing system that uses cameras and image processing to detect substrate features and automatically determine stitching paths. The system substitutes human visual inspection and manual path following with automated optical detection and computational path planning, thereby increasing productivity while managing complexity through software-based solutions.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system performs self-guidance by automatically detecting substrate patterns, calculating optimal stitching paths, and correcting its own positioning in real-time without external manual intervention. The guiding apparatus uses its own sensors and processors to navigate and stitch, making the system self-sufficient and reducing dependency on manual operation.

Inventive Principle:
Principle #25Self-service

2Adaptability or versatility

If the path is fixed on the substrate, then the system is easy to implement, but adaptability to different substrate styles and depths is limited

Engineering Contradiction:
Improvesubstrate style adaptabilityVSAvoidpath detection system complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent implements dynamic path adjustment where the stitching path is not fixed beforehand but is continuously determined and updated in real-time based on substrate detection. The system adapts its path dynamically by detecting substrate edges, patterns, and depth variations, allowing it to handle various substrate styles and depths without requiring pre-programmed paths for each configuration.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The guiding apparatus is designed to handle multiple substrate types, styles, and depths using a single unified detection and control system. The optical sensors and image processing algorithms are configured to recognize and adapt to diverse substrate characteristics, making the system universal rather than specialized for one particular substrate type or path configuration.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Manufacturing precision

If real-time self-correction is implemented, then stitching precision is improved, but the system complexity increases

Engineering Contradiction:
Improvestitching precisionVSAvoidcontrol system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent incorporates real-time feedback mechanisms where the optical sensors continuously monitor the actual stitching path and substrate position, compare it with the desired path, and automatically make corrections. The system uses closed-loop control where detection results feed back to the control algorithm, which adjusts the stitching path in real-time to maintain precision despite variations in substrate positioning or needle drift.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS12043934B2Methods and systems for stitching along a predetermined path
Publication Date: 2024.07.23 RAD LAB 1 INC
  • US12043934B2 patent drawing
  • US12043934B2 patent drawing
  • US12043934B2 patent drawing

AI summary

Disclosed is a guiding apparatus for use with a machine to facilitate performing an action along a self-guided path on a substrate. The guiding apparatus may include a support member configured to be attached to at least a portion of the machine. Further, the guiding apparatus may include one or more of lighting units, optical sensors, controllers, and user interface components, mounted on the support member, configured to identify an object, obtain position of the object on a substrate and perform an action along a self-guided path in association with that object on the substrate.