Optical Interconnects for Charged Particle Beam Deflection
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Solution Overview
Problem
The increasing number of charged particle beams and reduced beam pitch in multi-electron beam lithography devices lead to congestion in charged particle beam control signal interconnects, resulting in degraded signal quality due to crosstalk, signal attenuation, and electromagnetic interference, which limits throughput and pattern lithography quality.
Innovation Solution
A charged particle beam deflection device utilizing optical interconnects with an optical waveguide to manage higher density control signal interconnects, employing electric field deflection controlled by an optoelectric conversion element to eliminate electromagnetic interference and reduce power consumption, while directly controlling blankers without electrical amplifiers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the number of charged particle beams is increased and beam pitch is reduced to improve throughput, then productivity increases, but signal quality degrades due to crosstalk and electromagnetic interference in control signal interconnects
Solution Approach 1:
The patent replaces electrical interconnects with optical interconnects using waveguides to transmit control signals to deflectors. This substitution eliminates electromagnetic interference and crosstalk between adjacent control lines, maintaining signal quality while supporting increased beam density and higher throughput in multi-beam charged particle lithography systems.
2Ease of operation
If electrical interconnects are used to control deflectors, then ease of operation is maintained, but electromagnetic interference and power consumption increase
Solution Approach 1:
The patent substitutes optical waveguides for electrical interconnects in controlling deflector elements. Optical signals transmitted through waveguides eliminate electromagnetic interference and reduce power consumption while maintaining precise control capability over the deflectors through optoelectric conversion at the deflector location.
3Ease of manufacture
If electrical interconnects are used for control signals, then ease of manufacture is maintained, but device complexity increases due to amplifier circuits and power management
Solution Approach 1:
The patent replaces complex electrical control circuits with optical waveguide-based control systems. This substitution eliminates the need for electrical amplifiers, power management circuits, and associated complexity while maintaining manufacturability through standard semiconductor fabrication processes for integrating waveguides and optoelectric converters.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses electromagnetic interference and signal degradation, enhancing device reliability and throughput by reducing power consumption and preventing misoperation or degradation of electronic circuits, thereby improving the overall performance of electron beam lithography devices.
Implementation Method 1
an optical waveguide providing an optical signal to the light receiving element
Implementation Method 2
a light receiving element controlling a voltage applied to one electrode of the electrode pair
Implementation Method 3
a plurality of electrode pairs deflecting charged particle beams passing through the charged particle beam transmission apertures
Data Source
AI summary
According to one embodiment, a charged particle beam deflection device includes a substrate, a plurality of charged particle beam transmission apertures provided in the substrate, a plurality of electrode pairs deflecting charged particle beams passing through the charged particle beam transmission apertures, a light receiving element controlling a voltage applied to one electrode of the electrode pair, and an optical waveguide providing an optical signal to the light receiving element. A distance between the charged particle beam transmission aperture and the light receiving element is shorter than a distance between mutually-adjacent charged particle beam transmission apertures.