Optical Laminate UV Carbonated Water Cleaning
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Solution Overview
Problem
In the manufacturing of optical laminates for semiconductors, particularly photomasks, existing methods fail to effectively remove residual ions and particles from the surface, leading to defects and undesired haze during the exposure process, which complicates the refinement of wiring patterns and increases grainy impurities.
Innovation Solution
A method involving UV cleaning and the use of carbonated water, with optional hydrogen water, to remove residual ions and particles, where UV rays with specific wavelengths and intensities are applied followed by rinsing with carbonated or hydrogen water to minimize surface damage and maintain optical properties, while a sputtering method is used to manufacture the light-shielding film with transition metals and reactive gases.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional cleaning methods are used, then manufacturing process is simple, but residual ions and particles remain on the surface causing defects and haze
Solution Approach 1:
The patent applies UV irradiation at specific wavelengths (190-290 nm) and controlled intensity (1-11 mW/cm2) to activate the cleaning process. By changing the physical-chemical parameters of the cleaning environment through UV treatment, residual ions and organic contaminants are effectively removed without requiring complex mechanical cleaning equipment, thus improving reliability while maintaining process simplicity.
Solution Approach 2:
The patent replaces conventional mechanical cleaning methods with a photochemical cleaning mechanism using UV irradiation followed by carbonated water rinsing. This substitution eliminates the need for complex mechanical cleaning equipment and harsh chemicals, achieving superior cleaning effectiveness through optical and chemical interactions instead.
2Reliability
If strong cleaning methods are used to remove residual ions, then surface cleanliness improves, but surface damage and optical property variation increase
Solution Approach 1:
The patent carefully controls the UV irradiation parameters (wavelength 190-290 nm, intensity 1-11 mW/cm2) and carbonated water properties (electric conductivity 1-10 μS/cm) to achieve effective cleaning while minimizing surface damage. These optimized parameters ensure that residual ions are removed without causing excessive surface erosion or optical property variation, maintaining manufacturing precision.
Solution Approach 2:
The patent introduces carbonated water as an intermediary substance between UV irradiation and the surface. The carbonated water, with its controlled electric conductivity, acts as a gentle yet effective medium that removes activated contaminants without directly damaging the surface, thus preserving optical properties while achieving high cleanliness.
3Reliability
If multiple cleaning steps are added to reduce residual ions, then cleaning effectiveness improves, but processing time and complexity increase
Solution Approach 1:
The patent combines UV irradiation and carbonated water cleaning into a single integrated process step. The UV treatment activates the contaminants, and the carbonated water simultaneously rinses them away, achieving effective residual ion removal in one combined operation rather than multiple separate cleaning steps, thus maintaining productivity.
Solution Approach 2:
The patent implements a continuous cleaning process where UV irradiation and carbonated water rinsing are performed in immediate succession without interruption. This continuous action ensures that activated contaminants are removed promptly, achieving high cleaning effectiveness while minimizing processing time and maintaining manufacturing throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces residual ions and particles, minimizing defects and haze, maintaining low variations in optical density and thickness, and ensuring the accuracy of pattern refinement in semiconductor manufacturing.
Implementation Method 1
applying UV rays and carbonated water to the process target
Implementation Method 2
UV rays with a wavelength ranging 190 nm to 290 nm with an intensity of 1 mW/cm2 to 11 mW/cm2
Implementation Method 3
carbonated water with an electric conductivity of 1 μS/cm to 10 μS/cm
Implementation Method 4
performing the sputtering while allowing a reactive gas including a gas containing oxygen atoms, a gas containing nitrogen atoms, or a gas containing carbon atoms to be injected
Data Source
AI summary
The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.