Optical Material Testing for Lithography

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current methods are unable to quickly and efficiently determine irreversible radiation damage in optical materials, which is crucial for selecting suitable materials for long-term lithographic applications, as existing procedures are time-consuming and only assess short-term, reversible damage.

Innovation Solution

A method involving three tests: irradiating with ultraviolet radiation below 250 nm to measure non-intrinsic fluorescence, high energy density laser light to assess absorption changes, and forming color centers to compare absorption spectra before and after irradiation, which indicates both short-term and long-term radiation damage mechanisms.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If existing testing methods are used to determine radiation damage in optical materials, then short-term reversible damage can be assessed, but long-term irreversible radiation damage cannot be determined quickly

Engineering Contradiction:
Improvedetection of irreversible radiation damageVSAvoidtesting duration
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent applies preliminary action by pre-irradiating the optical material with high-energy radiation (such as X-rays or gamma rays) to create color centers and simulate long-term radiation damage effects before the actual measurement. This preliminary treatment accelerates the damage process that would normally occur over extended periods of operational use, allowing irreversible damage to be detected in a short testing timeframe rather than waiting for natural degradation during actual device operation.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent employs parameter changes by utilizing high-energy radiation with sufficient energy to create color centers in the optical material. By changing the energy parameter of the irradiation (using high-energy photons instead of normal operational wavelengths), the testing method can induce and detect irreversible structural changes and absorption changes that simulate long-term damage, thereby enabling rapid assessment of long-term stability without requiring prolonged exposure to operational conditions.

Inventive Principle:
Principle #35Parameter changes

2Loss of energy

If optical materials with high transmission are selected for lithographic systems, then absorption and heating are reduced, but irreversible radiation damage accumulates over long-term use

Engineering Contradiction:
Improveradiation absorptionVSAvoidlong-term stability
Core Design Contradiction:
Loss of energyVSReliability

Solution Approach 1:

The patent applies preliminary action by pre-irradiating the optical material with high-energy radiation to create color centers and simulate long-term radiation damage effects before the actual measurement. This preliminary treatment accelerates the damage process that would normally occur over extended periods of operational use, allowing irreversible damage to be detected in a short testing timeframe rather than waiting for natural degradation during actual device operation.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent converts the harmful effect of radiation-induced color center formation into a beneficial testing mechanism. By deliberately creating color centers through high-energy pre-irradiation, the method transforms the normally detrimental long-term accumulation of radiation damage into an immediate, measurable effect that reveals the material's long-term stability characteristics during a short test, thereby turning a reliability concern into a diagnostic advantage.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

3Manufacturing precision

If high energy density radiation is used for lithography, then smaller circuit structures can be produced, but absorption and heating of optical materials increase

Engineering Contradiction:
Improvecircuit resolutionVSAvoidmaterial heating
Core Design Contradiction:
Manufacturing precisionVSTemperature

Solution Approach 1:

The patent employs parameter changes by utilizing high-energy radiation with sufficient energy to create color centers in the optical material. By changing the energy parameter of the irradiation (using high-energy photons instead of normal operational wavelengths), the testing method can induce and detect irreversible structural changes and absorption changes that simulate long-term damage, thereby enabling rapid assessment of long-term stability without requiring prolonged exposure to operational conditions.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for the rapid determination of optical materials' suitability for long-term use by identifying irreversible absorption changes, ensuring materials meet predetermined standards for stability and reducing waste and costs in lens system production.

Implementation Method 1

irradiating with ultraviolet radiation below 250 nm to measure non-intrinsic fluorescence

Methodology Applied
Scientific EffectFluorescence: Fluorescence

Implementation Method 2

high energy density laser light to assess absorption changes

Methodology Applied
Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 3

forming color centers to compare absorption spectra before and after irradiation

Methodology Applied
Scientific EffectPhotoionisation: Photoionisation

Data Source

PatentUS7742156B2Method of testing optical materials by irradiating with high energy density radiation, optical materials selected by said method and uses thereof
Publication Date: 2010.06.22 HELLMA MATERIALS GMBH & CO KG
  • US7742156B2 patent drawing
  • US7742156B2 patent drawing
  • US7742156B2 patent drawing

AI summary

An optical material for lithographic applications is selected from crystal materials by a testing method. The crystal materials are preferably quartz and/or alkali or alkaline earth halides, especially fluorides, or mixed crystals. The testing method includes three tests to measure irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at 193 nm and the non-intrinsic fluorescence intensity at 740 nm is measured; 2) the optical material is irradiated with high energy density laser light and a change in respective absorptions before and after irradiation at 385 nm is measured; and 3) the optical material is irradiated with an X-ray or radioactive source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.