Optical Measurement Device with Interferometer-Based Position Correction
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Solution Overview
Problem
Current optical measurement devices for semiconductor manufacturing face challenges in precision due to large masks requiring manual calibration and increased size, leading to errors and inconvenient maintenance, especially when measuring large substrates.
Innovation Solution
An optical measurement device and method that includes a substrate carrier, optical detection platform frame, and measurement modules to measure and correct positional deviations of the substrate and optical detection unit, using interferometers and laser sensors to improve precision and automate calibration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a large mask is used for periodical correction to ensure measurement precision, then measurement precision is improved, but maintenance becomes inconvenient and the apparatus size increases
Solution Approach 1:
The patent replaces the mechanical large mask correction system with an optical measurement system using interferometers. The interferometers measure the actual positions of the substrate carrier and optical detection unit, and the system calculates and corrects mark positions through computational methods, eliminating the need for physical large masks and manual calibration operations.
Solution Approach 2:
The measurement system performs self-calibration by automatically measuring its own component positions (substrate carrier and optical detection unit) using interferometers. The system calculates deviations and corrects mark positions autonomously without requiring external manual intervention or large calibration masks.
2Area of stationary object
If the substrate size is increased, then the measurement range is improved, but the mask size must also be increased resulting in limitations in use
Solution Approach 1:
The patent divides the measurement system into multiple interferometers positioned at different locations (X-direction and Y-direction interferometers for both substrate carrier and optical detection unit). Each interferometer independently measures local position and inclination, allowing the system to handle large substrates without requiring a single large mask, thus improving adaptability to different substrate sizes.
3Area of stationary object
If the mask size is increased to cover the whole measurement range, then the measurement range is improved, but the range of motion extension increases the error
Solution Approach 1:
The patent replaces the mechanical large mask with an optical measurement and calculation system. Interferometers measure the actual positions and inclinations of components, and the system computationally corrects mark positions based on these measurements, eliminating the accumulation of errors that occurs with large mechanical masks covering extended measurement ranges.
Solution Approach 2:
The system uses interferometers to continuously measure the actual positions of the substrate carrier and optical detection unit during movement. These measurements provide feedback that is used to calculate and correct mark position deviations in real-time, compensating for errors introduced by the extended range of motion.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances measurement precision by calculating and correcting positional deviations, reducing errors associated with large substrates and facilitating automatic calibration, thus improving the convenience and accuracy of optical measurements.
Implementation Method 1
A substrate carrier position measurement module, configured to measure a position of the substrate carrier; an optical detection unit position measurement module, configured to measure a position of the optical detection unit
Implementation Method 2
an optical detection unit Y-direction measuring component, configured to measure an offset of the optical detection unit with respect to the optical detection platform frame in the Y direction during X-direction movement of the optical detection unit
Data Source
AI summary
An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module (5) and a substrate carrier (6) which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module (5) and the substrate carrier (6) and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate (9).