Optical Preform Etching and Halogen Cleaning

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Solution Overview

Problem

The manufacturing process of optical fibers introduces defects such as refractive index variations due to redeposited germanium compounds during the etching step, leading to reduced optical performance and increased fiber breaks.

Innovation Solution

A method involving etching an optical fiber preform with fluorine-based gases to create a redeposited Ge compound contamination, followed by a cleaning step using a halogen gas like chlorine or bromine at elevated temperatures to remove the contamination without further contaminating the remaining oxide material, ensuring minimal refractive index deviations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If fluorine-based etching gas is used to remove deposited oxide material during preform manufacturing, then the deposited material is removed effectively, but germanium compounds are redeposited on the preform surface causing contamination

Engineering Contradiction:
Improveremoval of deposited oxide materialVSAvoidredeposited germanium compound contamination
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The etching process is divided into multiple sequential steps with different gases: first using fluorine-based etching gas to remove deposited material, then using oxygen-containing gas to oxidize redeposited germanium compounds, and finally using halogen-containing cleaning gas to remove the oxidized contaminants. This segmentation allows each step to address a specific aspect of the contamination problem without causing harmful side effects.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

An oxygen-containing gas is introduced as an intermediary substance between the fluorine-based etching gas and the halogen-based cleaning gas. The oxygen oxidizes the redeposited germanium compounds into germanium oxides, transforming them into a form that can be easily removed by the subsequent halogen-based cleaning step, thus acting as a mediator that facilitates the removal process.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-generated harmful factors

If multiple etching and cleaning steps are performed to remove germanium contamination, then the preform quality is improved, but the manufacturing process complexity increases

Engineering Contradiction:
Improvegermanium compound contamination removalVSAvoidetching and cleaning process steps
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

Each gas type introduced in the process serves multiple functions: fluorine-based gas both etches deposited material and causes germanium redeposition; oxygen-containing gas both oxidizes germanium compounds and prepares the surface for cleaning; halogen-based gas both cleans oxidized germanium and can serve as a drying agent. This multi-functionality reduces the need for additional specialized steps, thereby managing process complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The process utilizes changes in gas composition, temperature, and flow rates to achieve different objectives within a unified processing system. By adjusting these parameters between steps, the same equipment can perform multiple functions (etching, oxidation, cleaning) without requiring separate dedicated equipment for each operation, thus managing complexity while achieving thorough contamination removal.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If fluorine-based etching is used to clean the preform, then deposited material is removed, but refractive index deviations are introduced in the core region

Engineering Contradiction:
Improvedeposited material removalVSAvoidrefractive index uniformity
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The harmful redeposited germanium compounds created by fluorine-based etching are converted into beneficial removable germanium oxides through oxidation with oxygen-containing gas. This transformation turns the harmful contamination into a temporary intermediate state that facilitates complete removal in the subsequent cleaning step, ultimately achieving better refractive index uniformity than fluorine-based etching alone could provide.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This process effectively removes redeposited germanium compounds, reducing refractive index variations and improving the quality of optical fibers by minimizing defects and increasing manufacturing yields.

Implementation Method 1

etching an inner portion of an optical fiber preform to remove a portion of an oxide material deposited on the preform by using a gas comprising an etchant gas containing fluorine

Methodology Applied
Scientific EffectChemical etching:

Implementation Method 2

cleaning the etched preform by providing to the inner portion of the preform a cleaning gas containing at least one halogen gas to remove redeposited Ge compound contamination

Methodology Applied
Scientific EffectChemical cleaning:

Implementation Method 3

cleaning the etched preform at a temperature between 800°C and 1600°C by providing to the surface of the inner portion of the preform a cleaning gas

Methodology Applied
Scientific EffectThermal processing: Heating

Data Source

PatentEP2294021B1Process for preparing an optical preform
Publication Date: 2019.09.11 CORNING INC
  • EP2294021B1 patent drawingFigure 1A
  • EP2294021B1 patent drawingFigure 1B
  • EP2294021B1 patent drawingFigure 1C

AI summary

A method of preparing an optical preform includes the steps of: a) etching an optical preform to remove a portion of an oxide material deposited on the preform by using a gas comprising an etchant gas containing fluorine at a sufficient temperature and gas concentration to create a redeposited germanium containing compounds contamination such as GeOx in the remaining oxide material; and b) cleaning the etched preform using a cleaning gas containing at least one halogen gas at a sufficient temperature and gas concentration to remove the redeposited germanium containing compound contamination without any substantial further contamination of the remaining deposited oxide material. Preferably the halogen is either chlorine or bromine.