Simultaneous Optical and Process Parameter Determination
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Solution Overview
Problem
Conventional lithography simulators cannot simultaneously determine optical and process parameters, leading to prolonged parameter determination times and difficulties in achieving desired image performance as micropatterning advances.
Innovation Solution
A method that uses an optical simulator to calculate light intensity distribution and resist images based on optical parameters, and a process simulator to calculate process images based on process parameters, with iterative evaluation and adjustment of parameters to meet specific criteria, allowing for simultaneous determination of both optical and process parameters within a short time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If optical parameters and process parameters are independently determined using separate simulators, then each parameter can be optimized separately, but the parameter determination time is prolonged and the mutual relationship between parameters cannot be fully utilized
Solution Approach 1:
The patent merges the optical simulator and process simulator into a unified simulation system that can simultaneously determine both optical parameters and process parameters. The optical simulator calculates light intensity distribution and resist images, while the process simulator calculates process images, with both simulators working in an integrated framework that leverages the mutual relationship between optical and process parameters to reduce overall determination time while maintaining high accuracy.
2Manufacturing precision
If conventional separate simulation approaches are used, then system complexity is reduced, but the ability to achieve desired image performance in advanced micropatterning is compromised
Solution Approach 1:
The patent segments the simulation system into distinct functional modules: an optical simulator module that handles light intensity distribution and resist image calculation, and a process simulator module that handles process image calculation. Each module maintains its specialized functionality while operating within a unified framework that coordinates between optical and process parameters, enabling advanced micropatterning performance without overwhelming complexity in any single module.
Data Source
AI summary
The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist.