Optical Radiation Sensor for Non-Intrusive Plasma Monitoring

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Solution Overview

Problem

Current optical radiation monitoring techniques for manufacturing processes, such as those used in semiconductor and flat panel display production, are intrusive and provide only global or averaged measurements, lacking spatial and temporal resolution, which hinders precise control of process conditions.

Innovation Solution

A sensor apparatus with a transparent window and embedded sensors, connected via conductors and a controller, capable of measuring optical radiation distributions and trajectories without modifying the process chamber, allowing for non-intrusive, spatially and temporally resolved data collection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If standard monitoring methods are used for optical radiation processes, then measurements can be obtained, but the methods are intrusive and require modifications to the process chamber

Engineering Contradiction:

Improveoptical radiation measurementVSAvoidprocess chamber modification

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The patent introduces an intermediary optical system consisting of mirrors, beam splitters, and lenses that redirect a portion of the optical radiation to a spectrometer positioned outside the process chamber. This intermediary optical path allows measurements to be taken without direct intrusion into the plasma environment, eliminating the need for modified process chambers while maintaining measurement capability.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Measurement precision

If standard monitoring methods are used, then global or averaged measurements are obtained, but spatial and temporal resolution is lost

Engineering Contradiction:

Improvespatial and temporal resolutionVSAvoidspatial distribution information

Core Design Contradiction:

Measurement precisionVSLoss of information

Solution Approach 1:

The patent segments the optical radiation field by using multiple mirrors and beam splitters to create separate optical paths that sample different spatial regions of the plasma. The spectrometer sequentially measures radiation from different locations, reconstructing the spatial distribution through coordinate mapping. This segmentation approach preserves spatial information that would otherwise be lost in global measurements.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system employs periodic scanning where the optical path is sequentially directed to different spatial locations within the process chamber. By rapidly switching between measurement positions and timing each measurement, the system captures temporal evolution of optical radiation parameters at each location, achieving both spatial and temporal resolution through periodic sampling.

Inventive Principle:

Principle #19Periodic action

3Reliability

If intrusive methods are used to monitor process conditions, then measurements can be taken, but the process operating conditions must be modified

Engineering Contradiction:

Improveprocess condition monitoringVSAvoidprocess operating flexibility

Core Design Contradiction:

ReliabilityVSAdaptability or versatility

Solution Approach 1:

The optical intermediary system acts as a mediator that enables process monitoring without requiring modifications to process operating conditions. The mirrors, beam splitters, and spectrometer are positioned to receive optical radiation that naturally emanates from the plasma during normal operation, allowing reliable monitoring while maintaining full adaptability of process parameters.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate and reproducible measurement of optical radiation parameters, improving process control and yield in manufacturing operations by providing detailed, real-time data without perturbing the process environment.

Implementation Method 1

A sensor apparatus is provided for measuring at least one of optical radiation distributions, optical radiation trajectories, and optical radiation spectrums

Methodology Applied

Scientific EffectOptical radiation detection: Photoelectric Effect

Data Source

PatentUS7482576B2Apparatuses for and methods of monitoring optical radiation parameters for substrate processing operations

Publication Date: 2009.01.27 KLA CORP

AI summary

One or more problems related to processing workpieces using processes that involve optical radiation are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting optical radiation data representing one or more process conditions used for processing a workpiece. In a further embodiment, the sensor apparatus is also configured for measuring data other than optical radiation.