Optical Semiconductor Device Multilayer Stacked Body

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Solution Overview

Problem

Current optical semiconductor devices, such as LEDs and laser diodes, face challenges in achieving high efficiency and luminance due to suboptimal light emission characteristics, particularly in the stacking structure and material composition of their active layers.

Innovation Solution

The optical semiconductor device incorporates a multilayer stacked body with alternating thick and thin film layers, including a nitride semiconductor material, forming a multiple quantum well (MQW) structure with specific barrier and well layers to enhance light emission efficiency and luminance, where the multilayer stacked body is directly under each well layer to ensure uniform characteristics and carrier confinement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Use of energy by moving object

If a conventional single-layer active structure is used, then the device complexity is low, but the light emission efficiency and luminance are insufficient

Engineering Contradiction:
Improvelight emission efficiencyVSAvoidstacking structure complexity
Core Design Contradiction:
Use of energy by moving objectVSDevice complexity

Solution Approach 1:

The active layer is segmented into multiple functional sub-layers including a multilayer stacked body with alternating thick and thin film layers, barrier layers, and well layers. This segmentation allows each sub-layer to perform specific functions (carrier confinement, recombination, light emission) thereby improving light emission efficiency while managing complexity through functional specialization

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the active layer are assigned different material compositions and thicknesses to optimize local properties. The multilayer stacked body has alternating thick/thin film layers with specific thickness ratios, barrier layers have specific width ranges, and well layers have optimized thicknesses. This local quality optimization enhances carrier confinement and recombination efficiency at critical interfaces while maintaining overall device performance

Inventive Principle:
Principle #3Local quality

2Illumination intensity

If the number of layers and film thickness are increased to improve light emission, then the luminance increases, but the total layer count and device complexity increase

Engineering Contradiction:
ImproveluminanceVSAvoidtotal number of layers
Core Design Contradiction:
Illumination intensityVSDevice complexity

Solution Approach 1:

The device employs composite material structures including a multilayer stacked body with alternating thick and thin film layers of different nitride semiconductor compositions. This composite structure achieves enhanced light emission and luminance through improved carrier confinement and recombination at the material interfaces, while the optimized thickness ratios and alternating pattern prevent excessive layer multiplication by maximizing the functional efficiency of each layer

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The invention optimizes specific parameters including the thickness of thin film layers (not more than thick film layers), the width of barrier layers (specific range), and the thickness of well layers. These parameter optimizations ensure that each layer contributes maximally to light emission efficiency, achieving high luminance without requiring an excessive number of layers. The parameter changes are designed to balance carrier confinement, recombination efficiency, and optical output

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration results in significantly improved light emission efficiency and luminance, with the optical semiconductor device achieving peak photo-luminescence intensity 8.6 times higher than a reference example without the multilayer stacked body and 2.6 times higher than another reference example with a different stacking configuration, while reducing the total number of layers and film thickness.

Implementation Method 1

The multilayer stacked body includes a plurality of thick film layers and a plurality of thin film layers alternately stacked in the direction. A multiple quantum well (MQW) structure with specific barrier and well layers to enhance light emission efficiency and luminance

Methodology Applied
Scientific EffectMultiple quantum well (MQW) structure: Potential Well

Implementation Method 2

A light emitting diode (LED) which is a semiconductor light emitting device using a nitride semiconductor

Methodology Applied
Scientific EffectElectroluminescence: Electroluminescence

Implementation Method 3

achieving peak photo-luminescence intensity 8.6 times higher than a reference example

Methodology Applied
Scientific EffectPhoto-luminescence: Photoluminescence

Data Source

PatentUS8604496B2Optical semiconductor device
Publication Date: 2013.12.10 SEOUL SEMICONDUCTOR
  • US8604496B2 patent drawing
  • US8604496B2 patent drawing
  • US8604496B2 patent drawing

AI summary

According to one embodiment, an optical semiconductor device includes an n-type semiconductor layer, a p-type semiconductor layer, and a functional part. The functional part is provided between the n-type semiconductor layer and the p-type semiconductor layers. The functional part includes a plurality of active layers stacked in a direction from the n-type semiconductor layer toward the p-type semiconductor layer. At least two of the active layers include a multilayer stacked body, an n-side barrier layer, a well layer and a p-side barrier layer. The multilayer stacked body includes a plurality of thick film layers and a plurality of thin film layers alternately stacked in the direction. The n-side barrier layer is provided between the multilayer stacked body and the p-type layer. The well layer is provided between the n-side barrier layer and the p-type layer. The p-side barrier layer is provided between the well layer and the p-type layer.