Optical Tool Measurement Shutter With Constricted Aperture Mode
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Solution Overview
Problem
Optical tool measurement devices for machine tools face challenges in protecting sensors from contamination in harsh environments, particularly due to the ineffectiveness of existing shutter systems in preventing debris and coolant ingress, especially in camera-based systems with larger apertures.
Innovation Solution
An optical tool measurement device with a shutter assembly that provides three configurations: closed for maximum protection, open for full vision mode, and constricted with a smaller aperture for reduced contamination resistance, allowing measurements even in contaminated environments, and an emulation mode for cleanliness assessment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a mechanical shutter is opened to allow light to reach the sensor for tool measurement, then tool inspection capability is enabled, but contaminants in the machine tool environment can ingress through the aperture and contaminate the sensor
Solution Approach 1:
The shutter assembly is designed to dynamically change the aperture size between fully open, constricted, and closed states. This dynamic adjustment allows the system to optimize between light transmission for tool inspection and contamination protection by constricting the aperture when contaminants are present in the environment
Solution Approach 2:
The invention changes the physical parameter of aperture size to resolve the contradiction. By varying the aperture diameter between large (for inspection) and small (for protection), the system adapts to different environmental conditions and operational requirements
2Object-affected harmful factors
If a transient air blast is used to clear debris from the aperture before opening the shutter, then some contamination protection is achieved, but this method is less effective for the large apertures required in camera-based systems
Solution Approach 1:
The system performs preliminary contamination assessment through a constricted aperture mode before transitioning to full inspection mode. This preliminary action allows the sensor to detect contaminants in the light path, and only when the environment is confirmed clean does the system open the aperture fully for tool inspection
3Object-affected harmful factors
If the shutter remains closed to protect the sensor from contamination, then sensor cleanliness is maintained, but tool measurements cannot be performed
Solution Approach 1:
The shutter assembly dynamically transitions between closed, constricted, and open states based on environmental conditions and measurement requirements. This dynamic behavior allows the system to maintain protection when needed while enabling measurements when the environment is suitable
Solution Approach 2:
The system uses feedback from the sensor to assess environmental cleanliness. When contaminants are detected in the light path during constricted aperture mode, the system maintains the constricted or closed state. When the environment is confirmed clean, the system transitions to full aperture for normal operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device offers enhanced contamination resistance and flexibility, combining the benefits of laser-based and vision-based tool measurement methods, ensuring reliable and repeatable measurements while minimizing sensor exposure to contaminants.
Implementation Method 1
a light source for directing light towards a tool-sensing region, a sensor for detecting light from the tool-sensing region
Data Source
AI summary
An optical tool measurement device for a machine tool is described. The device includes a light source for directing light towards a tool-sensing region and a sensor for detecting light from the tool-sensing region. A shutter assembly for selectively protecting the sensor from contamination is also provided. The shutter assembly is to provide a closed configuration in which the sensor is covered by the shutter assembly thereby preventing contamination of the sensor and an open configuration in which light can pass to the sensor through a first aperture of the shutter assembly. Furthermore, the shutter assembly is configured to additionally provide a constricted configuration in which light can pass to the sensor through a second aperture of the shutter assembly, the second aperture being smaller than the first aperture. In this manner, the device has enhanced resistance to contaminants, such as swarf and coolant, present in the machine tool environment.