Optical Switching for Maskless Lithography Data Transfer
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Solution Overview
Problem
Current maskless lithography systems face challenges in achieving high throughput due to bandwidth limitations in electrical interconnects, requiring excessive space and being sensitive to electromagnetic disturbances, while also struggling with data transfer rates needed for small feature sizes.
Innovation Solution
The implementation of a maskless lithography system using optical data transportation, with a beam generator, modulation means, and a control unit that converts pattern data into modulated light beams for controlling beamlets, allowing for increased throughput, reduced space requirements, and improved design flexibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If electrical interconnects are used to transfer pattern data in maskless lithography systems, then the system can operate with conventional electrical signaling, but the data transfer rate is limited by bandwidth constraints requiring excessive space and being sensitive to electromagnetic disturbances
Solution Approach 1:
The patent replaces electrical interconnects with optical interconnects for data transfer. Optical signals substitute electrical signals, enabling higher bandwidth and data transfer rates while reducing the physical space required for interconnect structures and eliminating sensitivity to electromagnetic disturbances.
Solution Approach 2:
The patent changes the fundamental parameter of signal transmission from electrical to optical domain. This parameter change enables dramatically higher data transfer rates (bandwidth) while reducing the cross-sectional area required for data transport, directly resolving the contradiction between productivity and space requirements.
2Reliability
If electrical interconnects are used for data transport, then the system can be implemented with conventional electronics, but the system becomes sensitive to electromagnetic disturbances
Solution Approach 1:
The patent substitutes optical signaling for electrical signaling in data transport. Optical signals are inherently immune to electromagnetic disturbances, improving reliability. The complexity increase is managed through integration of optical components into the lithography system architecture.
3Adaptability or versatility
If maskless lithography is used to achieve small feature sizes, then the system gains flexibility, but the data transfer rate requirements become excessively high
Solution Approach 1:
The patent uses optical interconnects to meet the extremely high data transfer rate requirements of maskless lithography for small feature sizes. Optical signals provide the necessary bandwidth to transport pattern data at the required rates while maintaining system flexibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables higher data transfer rates, reduces the system's sensitivity to electromagnetic disturbances, and minimizes space requirements, enhancing the overall performance and flexibility of the lithography system.
Implementation Method 1
at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means
Data Source
AI summary
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.