Optical Waveguide Slit Formation via Dry Etching

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Solution Overview

Problem

High relative refractive-index difference in optical waveguides leads to increased optical loss and difficulty in forming slits due to varying etching rates of core and cladding materials, especially when using dry etching, which results in uneven slit depths and damage to surrounding waveguides.

Innovation Solution

A manufacturing method involving layering cladding and core materials on a substrate, forming the core into a waveguide shape, creating a gap for the slit, and using dry etching to form the slit while ensuring the same etching material is used for both cladding layers, thereby maintaining consistent depth and avoiding damage to adjacent waveguides.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the relative refractive-index difference is increased to enable high-density integration, then the allowable minimum bend radius decreases and integration density increases, but the optical loss at the slit increases exponentially

Engineering Contradiction:
Improveintegration densityVSAvoidoptical loss at slit
Core Design Contradiction:
ProductivityVSLoss of energy

Solution Approach 1:

The patent changes the material parameters of the cladding layer by doping silica glass with zirconia to achieve a refractive index of 1.455-1.465 at 1550 nm wavelength. This parameter change enables the cladding to have sufficient refractive index to support high relative refractive-index difference waveguides while reducing optical loss at slits through optimized material composition

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If dry etching is used to form slits in high relative refractive-index difference waveguides, then slit formation is achieved, but the etching rates of core and cladding differ significantly causing uneven slit depths

Engineering Contradiction:
Improveslit formation capabilityVSAvoidslit depth uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent modifies the chemical composition parameters of the cladding layer by adding zirconia doping to silica glass, changing its etching rate characteristics. This parameter change reduces the etching rate difference between core and cladding materials during dry etching, enabling more uniform slit depth formation while maintaining the ability to form slits in high relative refractive-index difference waveguides

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If a dicing saw is used to form slits, then slit formation is achieved, but unnecessary cuts are made in surrounding portions causing damage to other optical waveguides

Engineering Contradiction:
Improveslit formation capabilityVSAvoiddamage to surrounding waveguides
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the mechanical dicing saw system with a dry etching process. This substitution eliminates the physical contact and wide cutting path of the mechanical saw, allowing precise slit formation without damaging surrounding optical waveguides while maintaining ease of manufacture

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method reduces optical loss and allows for precise slit formation without damaging surrounding optical waveguides, enabling stable light propagation and effective integration of wave plates in optical waveguide devices.

Implementation Method 1

when TE-polarized light (linearly polarized light having polarization direction parallel to a main surface of a substrate on which the cladding portion is formed) propagating through the optical waveguide is converted into TM-polarized light (linearly polarized light having a polarization direction perpendicular to TE-polarized light), a 1/2 wave plate is inserted into the slit

Methodology Applied
Scientific EffectBirefringence: Birefringence

Data Source

PatentUS11536898B2Optical waveguide device and manufacturing method of optical waveguide device
Publication Date: 2022.12.27 FURUKAWA ELECTRIC CO LTD
  • US11536898B2 patent drawing
  • US11536898B2 patent drawing
  • US11536898B2 patent drawing

AI summary

A manufacturing method of an optical waveguide device that allows light to propagate through a core formed within a cladding formed on a substrate, the core having a higher refractive index than the cladding, includes: layering a first cladding-material layer for the cladding and a core-material layer for the core sequentially on the substrate; forming the layered core-material layer into the core having a waveguide shape, and removing a first part of the core, the first part being positioned at a portion where a slit is to be formed, to thereby form a gap in the core; layering a second cladding-material layer for the cladding to cover the first cladding-material layer and the core; and removing, by dry-etching, a second part of the first and second cladding-material layers, the second part being positioned at the portion where the slit is to be formed, to thereby form the slit.