Optical Window Purge Partition for Stable Wafer Temperature Sensing
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Solution Overview
Problem
Contaminants from the process gas accumulate on the optical window of a radiation thermometer, making it difficult to perform highly reproducible temperature measurements in substrate processing apparatuses.
Innovation Solution
A substrate processing apparatus is equipped with a port that provides an optical path, an optical window mounted airtight, a purge gas supplier inside the process container, and a partition to guide purge gas to the optical window, preventing contamination and maintaining stable temperature measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the optical window is exposed inside the process chamber to enable temperature measurement, then temperature measurement capability is achieved, but contaminants accumulate on the optical window making measurements unreproducible
Solution Approach 1:
A partition structure is introduced as an intermediary element between the process chamber interior and the optical window. The partition creates a physical barrier that redirects process gas flow away from the optical window surface, preventing contaminant accumulation while maintaining optical access for temperature measurement.
Solution Approach 2:
The optical window is extracted from direct exposure to the process gas environment by positioning it within a partition-defined zone. This separation removes the optical window from the harmful process atmosphere while maintaining its functional connection to the chamber interior for measurement purposes.
2Measurement precision
If the optical window is exposed inside the process chamber, then optical path for temperature detection is established, but the optical window temperature rises due to heat from the process chamber
Solution Approach 1:
The partition acts as a thermal barrier and flow director, creating a protected zone around the optical window. By redirecting the process gas flow, the partition reduces direct heat transfer to the optical window while maintaining the optical path integrity for temperature detection.
Solution Approach 2:
The process chamber interior is segmented into different zones by the partition structure. The optical window is positioned in a separate, protected zone that is thermally and chemically isolated from the high-temperature process gas region, allowing the optical path to function without excessive heating.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Stable and reproducible temperature measurements are achieved by suppressing contamination and temperature rise of the optical window, ensuring efficient and accurate temperature control during substrate processing.
Implementation Method 1
an optical window that is mounted to the at least one port and transmits light
Implementation Method 2
the internal temperature of the process chamber is measured based on radiation light from the interior of the process chamber
Implementation Method 3
a purge gas supplier that is disposed inside the process container and provides a purge gas to an inner surface of the optical window
Data Source
AI summary
There is provided a configuration that includes at least one port that is provided in a process container in which a substrate is accommodated and heat-treated, the port providing an optical path that penetrates an interior of the process container and an exterior of the process container; an optical window that is mounted to the port and transmits light while maintaining the port airtight; a purge gas supplier that is disposed inside the process container and provides a purge gas to an inner surface of the optical window; and a partition that guides the purge gas from the purge gas supplier to the optical window.