Charged Particle Optics Mounting for Vacuum Chamber Deformation Isolation
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Solution Overview
Problem
Vacuum chamber deformations cause misalignment of charged particle optics, leading to impaired beam transmission and inaccurate analytical data in instruments like mass spectrometers and electron microscopes.
Innovation Solution
A kinematically constrained mounting system using inside and outside mounting members to isolate charged particle optics from vacuum chamber deformations, ensuring precise alignment by constraining six degrees of freedom and allowing for flexible movement to counteract chamber deformations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the vacuum chamber is deformed to adjust focal points of electric fields, then the focal points can be dynamically adjusted, but the chromatic aberration increases and image quality deteriorates
Solution Approach 1:
The vacuum chamber is divided into multiple independently deformable sections, each controlled by separate actuators. This allows selective deformation of specific chamber regions to adjust focal points for different ion masses without deforming the entire chamber, thereby reducing chromatic aberration while maintaining adaptability.
Solution Approach 2:
Different regions of the vacuum chamber are given different deformation characteristics and control parameters optimized for specific mass ranges. Lighter ion masses use one deformation profile while heavier ions use another, allowing each region to maintain optimal image quality for its designated mass range while providing overall adaptability.
2Adaptability or versatility
If the vacuum chamber is deformed to change focal points, then different ion masses can be focused, but the image quality and resolution deteriorate due to chromatic aberration
Solution Approach 1:
The system dynamically adjusts the deformation state of vacuum chamber sections based on the target ion mass being analyzed. By continuously adapting the chamber shape to match the specific mass range, the system maintains optimal image resolution for each measurement while preserving the ability to analyze different ion masses.
Solution Approach 2:
The physical parameters of the vacuum chamber (shape, curvature, spacing) are changed according to the specific measurement requirements. Different parameter sets are applied for different mass ranges, allowing the system to optimize image resolution for each measurement while maintaining versatility across multiple mass selection capabilities.
3Stability of the object's composition
If rigid support structures are used to maintain chamber shape, then structural stability is maintained, but the ability to dynamically adjust focal points is lost
Solution Approach 1:
The rigid support structure is segmented into multiple independently controllable sections. Each section can be locally deformed from its stable configuration to adjust focal points, while other sections maintain their stable shape. This provides both structural stability and dynamic adaptability for focal point adjustment.
Solution Approach 2:
The support structure transitions from a completely rigid state to a dynamically adjustable state. Actuators enable the structure to switch between stable configurations and deformed configurations as needed, providing both structural stability during operation and adaptability when focal point adjustment is required.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Maintains precise alignment of charged particle optics despite vacuum chamber deformations, preventing misalignments and ensuring stable beam transmission and accurate analytical data.
Implementation Method 1
the segmented vacuum chamber is deformable, and actuators attached to the vacuum chamber can cause the vacuum chamber to deform
Implementation Method 2
Each of the plurality of segments may have a respective electrode associated therewith that generates an electric field
Data Source
Figure 1A~1B
Figure 2A
Figure 2B
AI summary
A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.