Organic Light-Emitting Display with Zoned Dielectric Insulation

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Solution Overview

Problem

Existing display devices suffer from kickback voltage issues at the gate node of driving transistors, leading to afterimages due to the compensation transistor, which degrades image quality.

Innovation Solution

The dielectric constant of the gate insulating layer is varied in specific portions to address this, with higher dielectric constants in certain areas to mitigate kickback voltage, and the layer is made of silicon oxide with controlled oxygen and fluorine or carbon content to enhance insulation properties.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a compensation transistor is used to control the driving transistor, then the driving current can be compensated for threshold voltage variations, but kickback voltage occurs at the gate node causing afterimages

Engineering Contradiction:
Improvethreshold voltage compensationVSAvoidkickback voltage
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The gate insulating layer is divided into multiple regions with different dielectric constants: a first region between the driving active region and driving gate electrode with higher dielectric constant, and a second region between the compensation active region and compensation gate electrode with lower dielectric constant. This segmentation allows different portions of the gate insulating layer to serve different functions, reducing kickback voltage while maintaining threshold voltage compensation capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the gate insulating layer are assigned different dielectric properties: the first region has a higher dielectric constant (e.g., silicon oxide with high oxygen content or doped with nitrogen) to reduce kickback voltage, while the second region has a lower dielectric constant (e.g., silicon oxide with lower oxygen content or doped with fluorine) to maintain proper compensation transistor operation. This local quality differentiation resolves the contradiction between compensation functionality and kickback voltage reduction.

Inventive Principle:
Principle #3Local quality

2Object-generated harmful factors

If the dielectric constant of the gate insulating layer is increased to reduce kickback voltage, then afterimages are minimized, but the insulation properties and electrical characteristics may be compromised

Engineering Contradiction:
Improvekickback voltageVSAvoidinsulation properties
Core Design Contradiction:
Object-generated harmful factorsVSReliability

Solution Approach 1:

The gate insulating layer employs spatially varying dielectric constants: the first region has higher dielectric constant to reduce kickback voltage, while the second region has lower dielectric constant to maintain proper electrical insulation and transistor operation. This local differentiation allows each region to optimize for its specific function without compromising overall device reliability.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The gate insulating layer is constructed as a composite structure with multiple regions having different dielectric properties. The first region may use materials with higher dielectric constants (such as silicon oxide doped with nitrogen or having high oxygen content), while the second region uses materials with lower dielectric constants (such as silicon oxide doped with fluorine or having lower oxygen content), creating a composite structure that balances kickback voltage reduction with electrical insulation requirements.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces kickback voltage, improving image quality by minimizing afterimages and enhancing the performance of organic light-emitting display devices.

Implementation Method 1

a dielectric constant in a first portion of the gate insulating layer between the driving active region and the driving gate electrode is greater than a dielectric constant in a second portion of the gate insulating layer between the compensation active region and the compensation gate electrode

Methodology Applied
Scientific EffectDielectric constant variation: Dielectric Permittivity

Implementation Method 2

The gate insulating layer may include silicon oxide, and the number of oxygen atoms per unit volume in the second portion may be greater than the number of oxygen atoms per unit volume in the first portion

Methodology Applied
Scientific EffectSilicon oxide dielectric property: Dielectric Permittivity

Data Source

PatentEP3905328B1Organic light-emitting display device and method of manufacturing the same
Publication Date: 2025.09.10 SAMSUNG DISPLAY CO LTD
  • EP3905328B1 patent drawingFigure 1
  • EP3905328B1 patent drawingFigure 2
  • EP3905328B1 patent drawingFigure 3

AI summary

An organic light-emitting display device includes a driving transistor configured to control current to an organic light-emitting diode from a power voltage line, a compensation transistor configured to diode-connect the driving transistor in response to a voltage applied to a compensation gate electrode of the compensation transistor, and a gate insulating layer interposed between a driving active region of the driving transistor and the driving gate electrode, and between a compensation active region of the compensation transistor and the compensation gate electrode. A dielectric constant in a first portion of the gate insulating layer between the driving active region and the driving gate electrode is greater than a dielectric constant in a second portion of the gate insulating layer between the compensation active region and the compensation gate electrode.