Organic EL Device Masking to Prevent Voltage Increase
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Solution Overview
Problem
The existing methods for forming organic compound films in organic electroluminescence (EL) devices using photolithography face challenges such as exposure to air and light, chemical solution effects, and damage from inorganic mask layers, leading to deterioration of the organic compound film and increased voltage in the final device.
Innovation Solution
The use of an organic mask film containing specific organic compounds, such as those represented by General Formula (G1) or (G2), between the organic compound film and the inorganic mask layer, which allows for easier processing and removal of the inorganic mask layer using water or a water-based solvent, reducing damage and voltage increase.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography method is used to process organic compound film, then manufacturing precision is improved, but the organic compound film is exposed to air and light causing deterioration
Solution Approach 1:
An inorganic mask layer is introduced as an intermediary between the organic compound film and the external environment during photolithography processing. This inorganic layer serves as a protective barrier that prevents direct exposure of the organic film to air and light, thereby preventing deterioration while allowing the photolithography process to proceed for high-resolution patterning
2Manufacturing precision
If inorganic mask layer is used for hard mask, then manufacturing precision is improved, but chemical solution causes damage to organic compound film
Solution Approach 1:
The inorganic mask layer acts as a protective intermediary that shields the organic compound film from chemical solutions used in the photolithography process. This layer can be selectively removed after serving its protective function, leaving the organic film intact and undamaged
Solution Approach 2:
The mask system is segmented into multiple functional layers: the inorganic mask layer for chemical protection and the organic mask layer for pattern definition. This segmentation allows each layer to perform its specific function independently, with the inorganic layer providing chemical resistance and the organic layer enabling precise patterning
3Manufacturing precision
If inorganic mask layer is formed and removed, then manufacturing precision is improved, but voltage increases in the final device
Solution Approach 1:
The inorganic mask layer serves as a temporary intermediary that is completely removed after the photolithography process. This ensures that no residual inorganic material remains in the device structure that could cause voltage increases, while still providing the necessary protection during manufacturing
Solution Approach 2:
The inorganic mask layer is designed as a disposable protective element that is applied only during the critical photolithography process and then completely removed. It performs its protective function temporarily and is discarded to avoid any negative impact on the final device characteristics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of high-resolution organic EL devices with improved design flexibility and reliability by protecting the organic compound film from adverse effects, maintaining device characteristics and preventing voltage increase.
Implementation Method 1
an organic mask film containing an organic compound represented by General Formula (G1) or (G2) is formed over the organic compound film
Implementation Method 2
at least parts of the inorganic mask layer and the organic mask layer are removed with the use of water or a liquid including water as a solvent
Implementation Method 3
Carriers are injected by application of voltage to the device, and recombination energy of the carriers is used, whereby light emission can be obtained from the light-emitting material
Data Source
AI summary
An increase in voltage of a light-emitting device manufactured through a step of forming an aluminum oxide film in contact with an organic compound layer is inhibited. An organic compound film is formed over a first electrode. An organic mask film containing an organic compound which has low solubility to water or a chemical solution including water as a solvent is formed over the organic compound film. An inorganic mask layer is formed over the organic mask film. Shapes of the organic mask film and the organic compound film are processed with the use of the inorganic mask layer, whereby an organic mask layer and an organic compound layer are formed. At least parts of the inorganic mask layer and the organic mask layer are removed with the use of water or a liquid including water as a solvent.