Organic Layer Deposition via Overlapping Pattern Sheets
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Solution Overview
Problem
Conventional methods for manufacturing large-sized organic light-emitting display devices face challenges with fine metal mask (FMM) deposition, including mask warpage, pattern distortion, and low production efficiency due to the need for precise alignment and close contact with the substrate, which limits the size and complexity of patterns that can be deposited.
Innovation Solution
An organic layer depositing apparatus with first and second pattern sheets that are spaced apart from the substrate, allowing the deposition material to pass through patterning slits and overlap slits, enabling uniform deposition of organic layers on different regions of the substrate without the need for close contact, thus preventing pattern distortion and improving manufacturing speed and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If fine metal mask (FMM) is used for deposition, then pattern precision can be achieved, but mask warpage and pattern distortion occur due to close contact requirement with substrate
Solution Approach 1:
The patent introduces a pattern sheet as an intermediary component between the deposition source and substrate. This pattern sheet defines the deposition pattern through its structure rather than requiring direct contact between FMM and substrate, eliminating mask warpage and pattern distortion while maintaining pattern precision
Solution Approach 2:
The invention creates a pattern copy on the substrate by using the pattern sheet as a template. The pattern sheet's structure is replicated onto the substrate through material deposition, allowing pattern transfer without direct FMM-substrate contact, thus preventing distortion
2Manufacturing precision
If FMM is placed close to substrate for precise patterning, then pattern accuracy improves, but production efficiency decreases due to alignment complexity
Solution Approach 1:
The pattern sheet serves as a mediator that simplifies the deposition process. Instead of requiring precise alignment between FMM and substrate, the pattern sheet is positioned at a distance and defines the pattern through its physical structure, greatly reducing alignment complexity and improving production efficiency
Solution Approach 2:
The invention moves the patterning function from the vertical dimension (close contact between FMM and substrate) to the horizontal dimension (pattern sheet structure at a distance). This dimensional change allows pattern definition without precise vertical alignment, improving both accuracy and efficiency
3Manufacturing precision
If FMM deposition method is used, then organic layers can be deposited, but uniform thickness and pattern accuracy are difficult to achieve across large substrates
Solution Approach 1:
The pattern sheet acts as an intermediary that maintains consistent spacing from the substrate across large areas. This uniform spacing ensures even material deposition and consistent pattern accuracy across the entire substrate surface, overcoming the limitations of FMM for large substrates
Solution Approach 2:
The pattern sheet provides locally optimized deposition conditions at each position on the substrate. By maintaining appropriate distance and orientation across the entire substrate area, it ensures uniform material distribution and pattern quality from edge to edge
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures uniform thickness and pattern accuracy of organic layers across the substrate, enhancing the production efficiency and image quality of large-sized organic light-emitting display devices by minimizing defects and deformation, even on larger substrates.
Implementation Method 1
a deposition source that sprays the deposition material
Implementation Method 2
a first patterning unit and a first overlap unit, the first patterning unit defining a first patterning slit through which the deposition material passes
Data Source
AI summary
An organic layer depositing apparatus includes a deposition unit which includes one or more deposition assemblies spaced a predetermined distance apart from a substrate to deposit a deposition material on the substrate, wherein the one or more deposition assemblies include: a deposition source; a deposition source nozzle unit; a first pattern sheet which includes a first patterning unit and a first overlap unit; and a second pattern sheet which includes a second patterning unit and a second overlap unit, wherein the first and second pattern sheets are arranged such that the first and second overlap units overlap each other.