Organic Layer Patterning via Hydrophobic Protection and Water-Soluble Shielding

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Solution Overview

Problem

Current photolithographic methods for patterning organic semiconductor layers face challenges due to solvent-induced damage, as most solvents used in standard photoresists can dissolve organic layers, leading to degradation and reduced performance in devices like OLEDs, OPDs, and OPVs.

Innovation Solution

A method involving a hydrophobic protection layer and a water-soluble shielding layer is used, where the hydrophobic protection layer is applied before the shielding layer to prevent water penetration, allowing for effective patterning without damaging the organic semiconductor layers, and the shielding layer is easily removable with water.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a water-soluble shielding layer is used for photolithographic patterning of organic layers, then the shielding layer can be easily removed by water exposure, but water penetration into the organic layer causes damage and degradation

Engineering Contradiction:

Improveease of shielding layer removalVSAvoidorganic layer integrity

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

A hydrophobic protection layer is introduced as an intermediary between the organic layer and the water-soluble shielding layer. This protection layer acts as a mediator that allows water to easily remove the shielding layer while preventing water from penetrating and damaging the underlying organic layer, thus resolving the contradiction between easy removal and layer integrity

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The protective structure is segmented into multiple functional layers: the hydrophobic protection layer that repels water and protects the organic layer, and the water-soluble shielding layer that provides photolithographic shielding and can be easily removed. This segmentation allows each layer to perform its specific function without compromising the other

Inventive Principle:

Principle #1Segmentation

2Manufacturing precision

If standard photoresist solvents are used for photolithography, then patterning can be performed, but the solvents dissolve the organic layer causing degradation

Engineering Contradiction:

Improvepatterning capabilityVSAvoidorganic layer stability

Core Design Contradiction:

Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The hydrophobic protection layer serves as an intermediary barrier that prevents direct contact between the organic layer and the photoresist solvents. This allows standard photolithographic patterning to proceed using conventional solvents while the protection layer shields the organic layer from solvent-induced dissolution and degradation

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The approach converts the potentially harmful interaction between organic layers and photoresist solvents into a beneficial process by using the hydrophobic protection layer to enable the use of effective photolithographic solvents while preventing them from damaging the organic layer, thus turning a harmful situation into a controlled and beneficial patterning process

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly extends the operational lifetime of patterned organic devices by preventing water-induced degradation and allows for high-resolution patterning compatible with existing semiconductor processes, enabling the fabrication of flexible and high-definition organic electronic devices.

Implementation Method 1

providing on the organic layer a hydrophobic protection layer having a hydrophobic upper surface

Methodology Applied

Scientific EffectHydrophobic effect: Hydrophobe

Implementation Method 2

The shielding layer is a water-soluble layer that can easily be removed after photolithographic patterning by exposing the shielding layer to water or to a solution comprising water

Methodology Applied

Scientific EffectWater solubility: Solvation

Implementation Method 3

photolithographic patterning of the photoresist layer to thereby form a patterned photoresist layer

Methodology Applied

Scientific EffectPhotolithography: Photography

Implementation Method 4

etching the shielding layer and the organic layer using the patterned photoresist layer as a mask

Methodology Applied

Scientific EffectEtching:

Data Source

PatentUS10862036B2Method for high resolution patterning of organic layers

Publication Date: 2020.12.08 INTERUNIVERSITAIR MICRO ELECTRONICS CENT (IMEC VZW)

AI summary

At least one embodiment relates to a method for photolithographic patterning of an organic layer on a substrate. The method includes providing a water-soluble shielding layer over the organic layer. In addition, the method includes providing a photoresist layer on the water-soluble shielding layer. The method also includes photolithographic patterning of the photoresist layer to form a patterned photoresist layer. Further, the method includes etching the water-soluble shielding layer and the organic layer, using the patterned photoresist layer as a mask, to form a patterned water-soluble shielding layer and a patterned organic layer. Still further, the method includes removing the patterned water-soluble shielding layer. The method includes, before providing the water-soluble shielding layer, providing a hydrophobic protection layer having a hydrophobic upper surface on the organic layer.