Organic Processing Fluid Filtration for Semiconductor Patterning
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Solution Overview
Problem
The challenge in semiconductor manufacturing is the generation of particles during the formation of fine patterns (nodes of 30 nm or lower) in negative pattern formation techniques, which affects the performance of chemical amplification type resist films, particularly due to the elution of low molecular organic matter from filters during the filtration process.
Innovation Solution
A method for manufacturing an organic processing fluid using a filtration device with specific conditions, including a temperature difference of 3°C or lower between the input and output, a filtration speed of 0.5 L/min/m² or greater, and a filtration pressure of 0.10 MPa or lower, utilizing a filtration filter film with a pore size of 50 nm or lower, such as polyethylene, fluorine, or polyamide resin, to prevent the elution of low molecular organic matter and reduce particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If filtration is performed using a conventional filter during the manufacturing of organic processing fluid, then fine particles are removed from the fluid, but low molecular organic matter is eluted from the filter into the fluid, causing particle generation that degrades fine pattern formation
Solution Approach 1:
The patent changes the physical parameters of the filtration process by controlling the temperature difference between input and output sides to be 3°C or lower, and controlling filtration pressure to be 0.10 MPa or lower. These parameter changes prevent the elution of low molecular organic matter from the filter while maintaining effective particle removal, thus resolving the contradiction between particle removal and preventing harmful elution.
Solution Approach 2:
The patent applies preliminary anti-action by pre-controlling the filtration conditions (temperature difference and pressure) before elution can occur. By establishing these controlled conditions at the outset of the filtration process, the patent prevents the harmful elution of low molecular organic matter from happening in the first place, rather than attempting to correct it afterward.
2Productivity
If filtration speed is increased to improve productivity, then manufacturing efficiency increases, but filtration pressure must be increased which causes elution of low molecular organic matter from the filter
Solution Approach 1:
The patent changes the filtration parameters by decoupling filtration speed from pressure increase. Instead of increasing pressure to achieve higher filtration speed, the patent maintains pressure at 0.10 MPa or lower while achieving high filtration speed (0.5 L/min/m² or greater) through the controlled temperature difference condition, thus preventing elution while maintaining productivity.
3Manufacturing precision
If temperature difference across the filter is increased to improve filtration efficiency, then filtration performance improves, but elution of low molecular organic matter from the filter is promoted
Solution Approach 1:
The patent applies preliminary anti-action by pre-establishing the temperature difference constraint (3°C or lower) before elution can occur. This preliminary control prevents the thermal conditions that would promote elution of low molecular organic matter from the filter, while still achieving effective particle removal through the controlled filtration process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces particle generation, enhancing the precision and quality of fine pattern formation by ensuring that low molecular organic matter is not eluted during the filtration process, thereby improving the performance of negative pattern formation techniques.
Implementation Method 1
fine particles in the organic processing fluid are removed by a filter
Data Source
AI summary
There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI−To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.