Organic Processing Liquid Container for Semiconductor Patterning
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Solution Overview
Problem
The challenge in semiconductor manufacturing is the occurrence of particles during the formation of fine patterns (30 nm node or less) due to impurities in the organic developer, which affects the quality and performance of the electronic devices.
Innovation Solution
The use of an organic processing liquid with reduced concentrations of alkylolefin (1 ppm or less) and metal elements (5 ppm or less) in a container with an inner wall made of a resin different from polyolefin, such as polyethylene or polypropylene, or a metal subjected to rust-prevention/metal elution prevention treatment, to minimize impurity contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a polyolefin-based high purity resinous container is used to store organic developer, then cost is reduced and ease of manufacture is improved, but particle occurrence increases due to impurity elution
Solution Approach 1:
The patent changes the material parameter of the container from polyolefin-based resin to a composite structure with polyethylene-polypropylene resin and metal layer, which fundamentally alters the chemical interaction properties with the organic developer, preventing impurity elution while maintaining manufacturing feasibility
Solution Approach 2:
The patent employs a composite container structure combining polyethylene-polypropylene resin with a metal layer (aluminum, stainless steel, or tin). This composite material prevents the elution of impurities into the organic developer, thereby reducing particle occurrence in fine patterns while remaining cost-effective and manufacturable
2Manufacturing precision
If conventional organic developer is used for negative pattern forming, then fine pattern formation capability is achieved, but particle contamination occurs affecting 30 nm node or less fabrication
Solution Approach 1:
The patent extracts and removes the harmful impurity components (alkylolefin and metal elements) from the organic developer through controlled elution into a specially designed container, thereby purifying the developer and eliminating particle contamination that prevents 30 nm node or less fine pattern formation
Solution Approach 2:
The patent introduces a specially designed container as an intermediary between the organic developer and the environment. This container acts as a barrier that prevents external contamination and controls the chemical environment, enabling the organic developer to maintain its fine pattern formation capability without particle contamination
3Productivity
If storage time of organic developer is extended, then productivity is improved, but impurity concentration increases causing pattern quality degradation
Solution Approach 1:
The patent performs preliminary action by pre-treating the container with specific resins and metal layers before storing the organic developer. This preliminary preparation creates a stable chemical environment that prevents impurity generation during extended storage, allowing the developer to maintain pattern quality over longer periods and thus improving productivity
Data Source
AI summary
According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.