Organic Salt Photoresist for EUV Lithography
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Solution Overview
Problem
Chemically amplified photoresists used in semiconductor manufacturing face challenges with sensitivity and resolution, especially when using extreme ultraviolet (EUV) light, where the low photon count leads to noise and reduced pattern uniformity, and the high content of photoacid generators can deteriorate thermal stability and resolution.
Innovation Solution
An organic salt represented by Formula 1, containing selenium or tellurium as a cation and iodine, which acts as a photoacid generator or quencher, improving sensitivity and dispersibility, is used in a photoresist composition with a base resin and organic solvent to enhance resolution and pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the content of photoacid generator is increased to improve sensitivity in EUV lithography, then sensitivity is improved, but thermal stability deteriorates and resolution is reduced
Solution Approach 1:
The patent changes the chemical composition parameters by introducing organic salts containing selenium or tellurium cations and iodine-containing anions, which have different photoacid generation characteristics compared to conventional photoacid generators. This parameter change enables achieving high sensitivity at lower concentrations, thereby maintaining thermal stability while improving sensitivity.
Solution Approach 2:
The patent uses composite organic salt structures combining heavy metal cations (Se or Te) with iodine-containing organic anions. This composite material approach leverages the high photoacid generation efficiency of heavy metals and the thermal stability of organic compounds, resolving the contradiction between sensitivity improvement and thermal stability maintenance.
2Productivity
If the content of photoacid generator is increased to improve sensitivity, then sensitivity is improved, but resolution is reduced
Solution Approach 1:
The patent modifies the chemical parameters by using organic salts with specific heavy metal cations and iodine-containing anions that exhibit higher photoacid generation quantum efficiency. This allows achieving the required sensitivity with lower concentrations, thereby maintaining pattern resolution without the need for high photoacid generator content.
3Manufacturing precision
If conventional quenchers are used to control acid diffusion, then pattern formation is enabled, but dispersibility is poor and compatibility with base resin is reduced
Solution Approach 1:
The patent employs composite organic salt structures where the organic anion components are specifically designed to enhance compatibility with base resins. The organic nature of these salts improves dispersibility in the photoresist matrix while the quenching functionality remains effective in controlling acid diffusion and ensuring pattern uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The organic salt composition achieves improved sensitivity and resolution in EUV lithography, reducing noise and maintaining thermal stability while providing enhanced dispersibility and compatibility, leading to better pattern formation and reduced foreign particle issues.
Implementation Method 1
an acid formed by a reaction between light and a photoacid generator reacts again with a base resin
Implementation Method 2
there is a need for quenchers with improved dispersibility and/or improved compatibility with base resins
Data Source
AI summary
Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.