Organic TFT Through-Hole Insulation Prevents Cross-Talk

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Solution Overview

Problem

Current organic thin film transistors (TFTs) face malfunction due to cross-talk between adjacent devices, which is a significant issue in flexible flat panel displays, especially when using plastic substrates that require low-temperature processing.

Innovation Solution

The proposed solution involves an organic TFT structure with a through hole in the insulating and organic semiconductor layers outside the active region, using materials like pentacene and polyimide resin, and forming a closed curve around the source and drain regions to prevent cross-talk, along with a second insulating layer that can be either inorganic or polymer-based.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If organic semiconductors are used to enable low-temperature processing on plastic substrates, then manufacturing cost and flexibility are improved, but cross-talk malfunction between adjacent TFTs occurs

Engineering Contradiction:
Improvelow-temperature processing capabilityVSAvoiddevice operation reliability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent divides the organic semiconductor layer into distinct active regions and insulating regions, with through-holes creating physical separation between adjacent TFT devices. This segmentation prevents electrical interference (cross-talk) between neighboring devices while preserving the low-temperature processing advantages of organic semiconductors.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces an insulating layer with through-holes as an intermediary structure between adjacent organic semiconductor regions. This intermediary provides electrical isolation to prevent cross-talk malfunction, allowing organic TFTs to operate reliably on flexible plastic substrates at low temperatures.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If conventional polysilicon TFTs are used on plastic substrates, then device performance is maintained, but high-temperature processing damages the plastic substrate

Engineering Contradiction:
Improvedevice performanceVSAvoidprocessing temperature
Core Design Contradiction:
ReliabilityVSTemperature

Solution Approach 1:

The patent changes the material parameter of the semiconductor layer from conventional polysilicon to organic semiconductor materials, which have lower processing temperatures. This parameter change enables fabrication on plastic substrates without thermal damage while maintaining TFT functionality through proper structural design with insulating layers and through-holes.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If organic TFTs are manufactured without through-holes, then manufacturing process is simpler, but cross-talk between adjacent devices causes malfunction

Engineering Contradiction:
Improvestructure complexityVSAvoiddevice operation reliability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The through-holes segment the continuous organic semiconductor layer, creating isolated active regions for each TFT device. This segmentation is essential to prevent cross-talk and ensure reliable device operation, with the added complexity being minimal compared to the critical improvement in device reliability.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS8030642B2Organic thin film transistor, method of manufacturing the same, and flat panel display having the same
Publication Date: 2011.10.04 SAMSUNG DISPLAY CO LTD
  • US8030642B2 patent drawing
  • US8030642B2 patent drawing
  • US8030642B2 patent drawing

AI summary

Provided are an organic TFT, a method of manufacturing the same, and a flat panel display having the same. The organic TFT includes source and drain electrodes formed on the surface of a substrate, an organic semiconductor layer that includes source and drain regions and a channel region, located on the source and drain electrodes, a gate electrode located above the organic semiconductor layer, and a first insulating layer located on the surface of the organic semiconductor layer, wherein a through hole is formed in at least a portion of the organic semiconductor layer and the first insulating layer, outside an active region that includes the source and drain regions and the channel region.