Organic Underlayer Composition for Uniform Wafer Coating and Gap Fill

The patent introduces specific fluorine-containing structures (trifluoromethoxybenzene, perfluoroalkyl groups) to modify the chemical and physical parameters of the organic underlayer film. These structural changes improve surface activity and wettability, enabling uniform film formation and gap-free filling on complex substrate geometries while maintaining coating properties

The patent employs composite polymer structures combining different fluorine-containing moieties (trifluoromethoxybenzene groups combined with perfluoroalkyl chains) within the same polymer molecule. This composite approach synergistically improves both film uniformity and filling properties by combining the benefits of different fluorine structures

The patent extracts and removes the harmful perfluoroalkyl compound components from the system while retaining the beneficial film-forming properties by introducing alternative fluorine-containing structures (trifluoromethoxybenzene groups) that provide similar surface activity without the environmental persistence and toxicity issues of traditional perfluoroalkyl compounds

The patent converts the environmental harm associated with fluorinated compounds by selectively using fluorine structures that provide the necessary surface active effects for film formation while avoiding the specific perfluoroalkyl chain structures that cause environmental persistence and bioaccumulation, thus turning a potentially harmful class of compounds into an environmentally acceptable alternative