Original Plate Data Generation for Lithography Resolution Throughput
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Solution Overview
Problem
Current exposure apparatuses face limitations in improving both resolution and throughput, with existing methods focusing primarily on increasing numerical aperture, reducing exposure wavelength, or modifying patterns on the original plate, but not effectively addressing throughput enhancement.
Innovation Solution
A method for generating original plate data that calculates a two-dimensional transmission cross coefficient and interference map based on the distribution of light intensity on the pupil plane, and uses these calculations to iteratively generate patterns with auxiliary patterns, enhancing both resolution and throughput by optimizing light intensity distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional methods increase numerical aperture or reduce exposure wavelength to improve resolution, then manufacturing precision is improved, but device complexity and manufacturing difficulty increase
Solution Approach 1:
The patent changes the parameter of light intensity distribution on the pupil plane by introducing auxiliary patterns with specific transmission coefficients. This allows optimization of the aerial image intensity distribution without changing the numerical aperture or exposure wavelength, thereby improving resolution while avoiding increased device complexity
Solution Approach 2:
The patent applies local quality by creating non-uniform light intensity distribution across the pupil plane through strategically placed auxiliary patterns. Different regions of the pupil plane receive different intensities, which optimizes the aerial image formation for specific pattern features, improving resolution without requiring complex optical systems
2Productivity
If conventional methods increase light intensity or stage driving speed to improve throughput, then productivity is improved, but energy consumption and device complexity increase
Solution Approach 1:
The patent changes the light intensity distribution parameter on the pupil plane to optimize exposure efficiency. By concentrating light intensity at critical positions through auxiliary patterns, the system achieves better throughput without increasing overall energy consumption, as the light is used more effectively rather than simply increasing total intensity
3Manufacturing precision
If auxiliary patterns are inserted to decrease k1 factor and improve resolution, then manufacturing precision is improved, but the complexity of original plate design and calculation increases
Solution Approach 1:
The patent systematically changes parameters including auxiliary pattern positions, sizes, and transmission coefficients through automated calculation based on desired aerial image intensity distribution. This reduces the complexity of manual pattern design while achieving optimal k1 factor, as the calculation process automatically determines the complex pattern configuration
Solution Approach 2:
The patent employs feedback by iteratively calculating the aerial image formed by auxiliary patterns and adjusting their parameters to achieve the desired intensity distribution. This closed-loop optimization simplifies the overall design process by automatically converging on optimal pattern configurations without requiring complex manual design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves the resolution and throughput of the exposure apparatus by intensifying light interference at critical positions, leading to higher light intensity at the target pattern formation area, thus enhancing the accuracy and efficiency of the semiconductor device manufacturing process.
Implementation Method 1
intensifying light interference at critical positions, leading to higher light intensity at the target pattern formation area
Implementation Method 2
calculating a two-dimensional transmission cross coefficient based on a function indicating a distribution of an intensity of light formed on a pupil plane of the projection optical system
Data Source
AI summary
Method for generating data for an original plate used during processing for illuminating the original plate and projecting an image of a pattern onto the original plate onto a substrate via a projection optical system. A two-dimensional transmission cross coefficient is calculated based on a function indicating a distribution of an intensity of light formed on a pupil plane of the projection optical system. An approximate aerial image is calculated based on the calculated two-dimensional transmission cross coefficient and a first pattern on an object plane of the projection optical system. A second pattern is generated having the first pattern on the object place and auxiliary patterns based on the approximate aerial image. The original plate data is generated by repeatedly calculating the approximate aerial image and generating a second pattern that is used as the first pattern on the object plane.