Original Plate Mark Region Protection Against Acid Cleaning
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Solution Overview
Problem
Existing original plates used in imprint methods for semiconductor device manufacturing lack resistance to repeated cleaning with acidic or alkaline solutions, leading to reduced lifespan and potential damage during the cleaning process.
Innovation Solution
The original plate includes a substrate with a pattern region and a mark region, where the mark region is covered by a high contrast film for alignment and a low contrast film that provides acid resistance, alkali resistance, or oxidation resistance, extending the plate's lifespan and preventing damage during cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the original plate is cleaned with acidic or alkaline solutions repeatedly, then the cleaning effectiveness is improved, but the original plate suffers damage and its lifespan is reduced
Solution Approach 1:
A protective film is introduced as an intermediary layer between the alignment mark and the cleaning solution. This film acts as a mediator that allows the cleaning solution to pass through or interact with without directly damaging the underlying alignment mark structure, thus enabling effective cleaning while preserving the original plate's integrity and lifespan
Solution Approach 2:
A thin protective film is formed over the alignment mark region. This thin film provides a flexible protective barrier that allows the original plate to withstand repeated exposure to acidic and alkaline cleaning solutions without compromising the alignment mark's structural integrity, thereby extending the plate's usable life
2Measurement precision
If a high contrast film is used in the mark region for alignment, then the alignment precision is improved, but the resistance to cleaning solutions deteriorates
Solution Approach 1:
The alignment mark structure is constructed as a composite with multiple layers: a high contrast film layer that provides alignment precision and a protective film layer that provides resistance to cleaning solutions. This composite structure combines the advantageous properties of different materials to simultaneously achieve both alignment precision and cleaning resistance
Solution Approach 2:
Different regions of the original plate are given different properties: the alignment mark region has a high contrast film for precision alignment, while the protective film is applied specifically to regions subject to cleaning. This local differentiation allows each region to optimize its function without compromising the other
Data Source
AI summary
An original plate includes a substrate, a pattern region in which a fine pattern is disposed on the substrate, a mark region in which a mark, including an unevenness used for alignment with a transfer receiving body on the substrate, is disposed, a first film disposed in a concave portion of the mark region and having high contrast with respect to the substrate, and a second film covering the mark region and having contrast with respect to the substrate lower than that of the first film.