Orthogonal Beam Deflector Stacking for Compact Aberration Correction
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Solution Overview
Problem
Existing charged particle beam devices face challenges in arranging electrodes and magnetic poles close to the beam trajectory due to interference concerns, which limits the compactness and efficiency of beam deflection and aberration correction.
Innovation Solution
A beam deflection device is designed with electrostatic and magnetic field deflectors stacked along the beam trajectory, allowing electrodes and magnetic poles to overlap partially, generating orthogonal electric and magnetic fields to deflect the beam while maintaining precise aberration correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If electrodes and magnetic poles are spaced away from the beam trajectory to avoid interference, then device reliability is improved, but device volume increases and compactness is reduced
Solution Approach 1:
The patent transitions from a planar arrangement to a three-dimensional stacked configuration where electrostatic and magnetic deflectors are arranged in alternating layers along the beam propagation direction. This vertical stacking allows electrodes and magnetic poles to be positioned close to the beam trajectory without lateral interference, achieving compactness while maintaining reliability through proper spatial separation in the third dimension.
Solution Approach 2:
The patent implements a nested structure where multiple deflector pairs are integrated within a compact volume by stacking them along the beam axis. Each deflector pair (electrode+magnetic pole) is nested within the overall device structure, allowing multiple functional elements to coexist in a limited space without interfering with each other's operation.
2Volume of moving object
If electrodes and magnetic poles are arranged close to the beam trajectory, then device compactness is improved, but interference between components may increase
Solution Approach 1:
The patent divides the deflection system into multiple discrete deflector pairs, each consisting of an electrostatic deflector and a magnetic deflector. These segmented units are stacked alternately along the beam trajectory, allowing each pair to operate independently at close proximity to the beam without causing interference to other components. The segmentation enables precise control and isolation of each deflector's influence on the beam.
3Manufacturing precision
If multiple deflectors are stacked along the beam trajectory, then beam deflection precision is improved, but device complexity increases
Solution Approach 1:
The patent combines electrostatic and magnetic deflection functions into a unified stacked structure where both types of deflectors work cooperatively along the beam trajectory. By merging these different deflection mechanisms into an integrated multi-layer configuration, the system achieves enhanced beam deflection precision through the combined effect of multiple deflectors while managing complexity through a systematic alternating arrangement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the electrodes and magnetic poles to be positioned closer to the beam trajectory, enhancing the compactness and precision of beam deflection and aberration correction in charged particle beam devices, such as electron microscopes, without causing high-order aberrations.
Implementation Method 1
one or more electrostatic deflectors including a pair of electrodes arranged to sandwich therebetween a beam trajectory in a first direction orthogonal to the trajectory of the beam
Implementation Method 2
one or more magnetic field deflectors including a pair of magnetic poles arranged to sandwich therebetween the beam trajectory in a second direction orthogonal to the trajectory of the beam and the first direction
Data Source
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AI summary
The present disclosure pertains to a beam deflection device capable of properly deflecting a beam. The present disclosure provides a beam deflection device for deflecting a beam inside a charged particle beam device, said beam deflection device being provided with: one or more electrostatic deflectors (207, 208) each having a pair of electrodes disposed so as to face each other across a beam path in a first direction orthogonal to the beam path; and one or more magnetic deflectors (209) each having a pair of magnetic poles disposed so as to face each other across the beam path in a second direction orthogonal to the beam path and to the first direction. When viewed from an incident direction of the beam, the one or more electrostatic deflectors and the one or more magnetic deflectors are stacked along the beam path such that the pair of electrodes at least partially overlap with the pair of magnetic poles and with a gap between the pair of magnetic poles.