OTP Memory Device with Hafnium Oxide Gate Stack

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional non-volatile memory devices lack efficient one-time programmable (OTP) solutions that can reliably store data in a non-volatile state without requiring multiple programming cycles, especially in portable devices where space and power efficiency are critical.

Innovation Solution

A one-time programmable memory device utilizing a metal gate and high dielectric constant oxide layers, such as hafnium oxide, with a silicon dioxide layer, where the threshold voltage is shifted by ferroelectric field orientation or charge trapping mechanisms, allowing for a non-volatile programmable state that can be read and written once.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional volatile memory devices are used, then power consumption is low during operation, but data cannot be stored in a non-volatile state

Engineering Contradiction:
Improvenon-volatile data storageVSAvoidpower consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent changes the electrical parameters of the transistor by trapping charges in the oxide layer, which modifies the threshold voltage to represent different data states. This allows non-volatile storage by permanently altering the electrical characteristics of the device without requiring continuous power.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces conventional magnetic or optical storage mechanisms with an electrical charge trapping mechanism in the oxide layer. The trapped charges create a persistent electric field that maintains the data state without power, substituting physical field-based storage with electrostatic charge storage.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Adaptability or versatility

If multiple programming cycles are allowed, then data can be updated and corrected, but device complexity and manufacturing difficulty increase

Engineering Contradiction:
Improveprogramming flexibilityVSAvoidprogramming cycle complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent performs the programming action in a single definitive step where charges are trapped in the oxide layer during manufacturing or initial programming. This preliminary action establishes the data state permanently, eliminating the need for multiple programming cycles and associated complexity.

Inventive Principle:
Principle #10Preliminary action

3Quantity of substance

If high-density memory is implemented, then storage capacity increases, but manufacturing precision requirements increase

Engineering Contradiction:
Improvestorage densityVSAvoidfabrication precision
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent merges the memory functionality with the standard CMOS transistor structure by integrating the oxide layer directly into the transistor gate stack. This combination allows high-density memory to be implemented using existing semiconductor manufacturing processes without requiring separate fabrication steps or higher precision equipment.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables a cost-effective, high-density non-volatile memory solution for logic circuits, where the OTP device can be programmed to a specific state and read, suitable for use in portable electronics, with reduced power consumption and increased storage density.

Implementation Method 1

When the hafnium oxide comes into contact with silicon oxide, a ferroelectric field and dipole may be generated

Methodology Applied
Scientific EffectFerroelectric field:

Implementation Method 2

When the hafnium oxide comes into contact with silicon oxide, a ferroelectric field and dipole may be generated

Methodology Applied
Scientific EffectDipole:

Implementation Method 3

A threshold voltage of the OTP memory device may be related to a charge trap

Methodology Applied
Scientific EffectCharge trap:

Data Source

PatentEP3170204B1Method for programming a non-volatile one-time programmable memory device
Publication Date: 2021.05.26 QUALCOMM INC
  • EP3170204B1 patent drawingFigure 1A
  • EP3170204B1 patent drawingFigure 1B
  • EP3170204B1 patent drawingFigure 1C

AI summary

An apparatus includes a metal gate, a substrate material, and an oxide layer between the metal gate and the substrate material. The oxide layer includes a hafnium oxide layer contacting the metal gate and a silicon dioxide layer contacting the substrate material and contacting the hafnium oxide layer. The metal gate, the substrate material, and the oxide layer are included in a one-time programmable (OTP) memory device. The OTP memory device includes a transistor. A non-volatile state of the OTP memory device is based on a threshold voltage shift of the OTP memory device.